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Results:
1-7
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Results: 7
Authors:
WHITE DA
BONING D
BUTLER W
BARNA GG
Citation: Da. White et al., SPATIAL CHARACTERIZATION OF WAFER STATE USING PRINCIPAL COMPONENT ANALYSIS OF OPTICAL-EMISSION SPECTRA IN PLASMA ETCH, IEEE transactions on semiconductor manufacturing, 10(1), 1997, pp. 52-61
Authors:
BARNA GG
Citation: Gg. Barna, QUANTITATIVE SPECTRAL MEASUREMENT OF AIR LEAKS INTO PLASMA REACTORS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(4), 1995, pp. 2285-2287
Authors:
BARNA GG
LOEWENSTEIN LM
BRANKNER KJ
BUTLER SW
MOZUMDER PK
STEFANI JA
HENCK SA
CHAPADOS P
BUCK D
MAUNG S
SAXENA S
UNRUH A
Citation: Gg. Barna et al., SENSOR INTEGRATION INTO PLASMA ETCH REACTORS OF A DEVELOPMENTAL PILOTLINE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2860-2867
Authors:
BARNA GG
LOEWENSTEIN LM
ROBBINS R
OBRIEN S
LANE A
WHITE DD
HANRATTY M
HOSCH J
SHINN GB
TAYLOR K
BRANKNER K
Citation: Gg. Barna et al., MMST MANUFACTURING TECHNOLOGY - HARDWARE, SENSORS, AND PROCESSES, IEEE transactions on semiconductor manufacturing, 7(2), 1994, pp. 149-158
Authors:
MOZUMDER PK
BARNA GG
Citation: Pk. Mozumder et Gg. Barna, STATISTICAL FEEDBACK-CONTROL OF A PLASMA ETCH PROCESS, IEEE transactions on semiconductor manufacturing, 7(1), 1994, pp. 1-11
Authors:
BARNA GG
MOSLEHI MM
LEE YJ
Citation: Gg. Barna et al., SENSOR NEEDS FOR IC MANUFACTURING, Solid state technology, 37(4), 1994, pp. 57
Authors:
BARNA GG
LOEWENSTEIN LM
HENCK SA
CHAPADOS P
BRANKNER KJ
GALE RJ
MOZUMDER PK
BUTLER SW
STEFANI JA
Citation: Gg. Barna et al., DRY ETCH PROCESSES AND SENSORS, Solid state technology, 37(1), 1994, pp. 47
Risultati:
1-7
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