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Authors: SHEVELKO AP SHMAENOK LA CHURILOV SS BASTIAENSEN RKFJ BIJKERK F
Citation: Ap. Shevelko et al., EXTREME-ULTRAVIOLET SPECTROSCOPY OF A LASER-PLASMA SOURCE FOR LITHOGRAPHY, Physica scripta. T, 57(2), 1998, pp. 276-282

Authors: BIJKERK F SHMAENOK LA LOUIS E VOORMA HJ KOSTER NB BRUINEMAN C BASTIAENSEN RKFJ VANDERDRIFT EWJM ROMIJN J DEGROOT LEM ROUSSEEUW BAC ZIJLSTRA T PLATONOV YY SALASHCHENKO NN
Citation: F. Bijkerk et al., EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS, Microelectronic engineering, 30(1-4), 1996, pp. 183-186

Authors: BIJKERK F SHMAENOK LA SHEVELKO AP BASTIAENSEN RKFJ BRUINEMAN C VANHONK AGJR
Citation: F. Bijkerk et al., A HIGH-POWER, LOW-CONTAMINATION LASER-PLASMA SOURCE FOR EXTREME UV LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 299-301
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