Authors:
BIJKERK F
SHMAENOK LA
LOUIS E
VOORMA HJ
KOSTER NB
BRUINEMAN C
BASTIAENSEN RKFJ
VANDERDRIFT EWJM
ROMIJN J
DEGROOT LEM
ROUSSEEUW BAC
ZIJLSTRA T
PLATONOV YY
SALASHCHENKO NN
Citation: F. Bijkerk et al., EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS, Microelectronic engineering, 30(1-4), 1996, pp. 183-186
Authors:
BIJKERK F
SHMAENOK LA
SHEVELKO AP
BASTIAENSEN RKFJ
BRUINEMAN C
VANHONK AGJR
Citation: F. Bijkerk et al., A HIGH-POWER, LOW-CONTAMINATION LASER-PLASMA SOURCE FOR EXTREME UV LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 299-301