Authors:
KIZILYALLI IC
THOMA MJ
LYTLE SA
MARTIN EP
SINGH R
VITKAVAGE SC
BECHTOLD PF
KEARNEY JW
RAMBAUD MM
TWIFORD MS
COCHRAN WT
FENSTERMAKER LR
FREYMAN R
SUN WS
DUNCAN A
Citation: Ic. Kizilyalli et al., HIGH-PERFORMANCE 3.3- AND 5-V 0.5-MU-M CMOS TECHNOLOGY FOR ASICS, IEEE transactions on semiconductor manufacturing, 8(4), 1995, pp. 440-448
Authors:
KAMGAR A
HILLENIUS SJ
BAKER RM
NAKAHARA S
BECHTOLD PF
Citation: A. Kamgar et al., GATE OXIDE THINNING AT THE ACTIVE DEVICE FOX BOUNDARY IN SUBMICROMETER PBL ISOLATION/, I.E.E.E. transactions on electron devices, 42(12), 1995, pp. 2089-2095