Authors:
DHOTE AM
MADHUKAR S
YOUNG D
VENKATESAN T
RAMESH R
COTELL CM
BENEDETTO JM
Citation: Am. Dhote et al., LOW-TEMPERATURE GROWTH AND RELIABILITY OF FERROELECTRIC MEMORY CELL INTEGRATED ON SI WITH CONDUCTING BARRIER STACK, Journal of materials research, 12(6), 1997, pp. 1589-1594
Citation: Ra. Moore et Jm. Benedetto, IONIZING RADIATION-INDUCED ASYMMETRIES OF THE RETENTION CHARACTERISTICS OF FERROELECTRIC THIN-FILMS, IEEE transactions on nuclear science, 42(6), 1995, pp. 1575-1584
Citation: Jm. Benedetto et al., EFFECTS OF OPERATING-CONDITIONS ON THE FAST-DECAY COMPONENT OF THE RETAINED POLARIZATION IN LEAD-ZIRCONATE-TITANATE THIN-FILMS, Journal of applied physics, 75(1), 1994, pp. 460-466