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ROUCH H
PONS M
BENEZECH A
BERNARD C
MADAR R
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Authors:
PONS M
BENEZECH A
HUGUET P
GAUFRES R
DIEZ P
LAFFORET D
Citation: M. Pons et al., CHEMICAL-VAPOR-DEPOSITION OF THICK TUNGSTEN COATINGS - RAMAN MEASUREMENTS AND MASS-TRANSPORT MODELING, Journal de physique. IV, 5(C5), 1995, pp. 143-150
Authors:
PONS M
BENEZECH A
HUGUET P
GAUFRES R
DIEZ P
LAFFORET D
Citation: M. Pons et al., CHEMICAL-VAPOR-DEPOSITION OF THICK TUNGSTEN COATINGS - RAMAN MEASUREMENTS AND MASS-TRANSPORT MODELING, Journal de physique. IV, 5(C5), 1995, pp. 143-150
Authors:
PONS M
BENEZECH A
HUGUET P
GAUFRES R
DIEZ P
LAFFORET D
Citation: M. Pons et al., CHEMICAL-VAPOR-DEPOSITION OF THICK TUNGSTEN COATINGS - MASS-TRANSPORTMODELING AND EXPERIMENTS, Journal de physique. III, 5(8), 1995, pp. 1145-1160
Authors:
ROUCH H
PONS M
BENEZECH A
BARBIER JN
BERNARD C
MADAR R
Citation: H. Rouch et al., MODELING OF CVD REACTORS - THERMOCHEMICAL AND MASS-TRANSPORT APPROACHES FOR SI1-XGEX DEPOSITION, Journal de physique. IV, 3(C3), 1993, pp. 17-23