Citation: F. Frost et al., REACTIVE ION-BEAM ETCHING OF INSB AND INAS WITH ULTRASMOOTH SURFACES, Semiconductor science and technology, 13(5), 1998, pp. 523-527
Authors:
ZIMMER K
DIENELT J
HERFURTH F
BRAUN A
OTTE K
LIPPOLD G
GOTTSCHALCH V
BIGL F
Citation: K. Zimmer et al., EXCIMER-LASER ETCHING OF GAAS, ALXGA1-XAS AND CUINSE2 IN CHLORINE ATMOSPHERE, Applied surface science, 129, 1998, pp. 800-804
Authors:
OTTE K
FROST F
SCHINDLER A
LIPPOLD G
GOTTSCHALCH V
FLAGMEYER RH
BIGL F
Citation: K. Otte et al., INFLUENCE OF ETCHING PARAMETERS ON THE DEFECT PROFILE AND THE DEPTH OF DAMAGE OF ALGAAS INDUCED BY ION-BEAM ETCHING, Microelectronic engineering, 42, 1998, pp. 427-430
Authors:
OTTE K
FROST F
SCHINDLER A
BIGL F
LIPPOLD G
GOTTSCHALCH V
FLAGMEYER RH
Citation: K. Otte et al., HIGH-PRECISION DEPTH PROFILING OF ARGON AND NITROGEN ION ETCHING-INDUCED DAMAGE IN AN ALGAAS GAAS MULTIPLE-QUANTUM-WELL STRUCTURE/, Thin solid films, 318(1-2), 1998, pp. 132-135
Citation: K. Otte et al., A MODIFIED BROAD-BEAM ION-SOURCE FOR LOW-ENERGY HYDROGEN IMPLANTATION, Review of scientific instruments, 69(3), 1998, pp. 1499-1504
Authors:
FROST F
OTTE K
SCHINDLER A
BIGL F
LIPPOLD G
GOTTSCHALCH V
Citation: F. Frost et al., MEASUREMENT OF THE DEPTH DISTRIBUTION OF ION-BEAM ETCHING-INDUCED DAMAGE IN ALGAAS GAAS MULTIPLE-QUANTUM-WELL STRUCTURE/, Applied physics letters, 71(10), 1997, pp. 1362-1364