Authors: MOLLER H BOBEL FG HERTEL B LINDENBERG T RITTER G

Citation: H. Moller et al., IN-SITU REAL-TIME TEMPERATURE AND THICKNESS MEASUREMENT FOR SI SIGE GROWTH ON MBE AND RTCVD SYSTEMS/, Journal of crystal growth, 157(1-4), 1995, pp. 327-332

Authors: RITTER G TILLACK B WEIDNER M ZAUMSEIL P BOBEL FG HERTEL B MOLLER H

Citation: G. Ritter et al., IN-SITU OBSERVATION OF CHEMICAL-VAPOR-DEPOSITION GROWTH OF EPITAXIAL SIGE THIN-FILMS BY REFLECTION SUPPORTED PYROMETRIC INTERFEROMETRY, Journal of crystal growth, 146(1-4), 1995, pp. 119-124

Authors: BOBEL FG MOLLER H WOWCHAK A HERTL B VANHOVE J CHOW LA CHOW PP

Citation: Fg. Bobel et al., PYROMETRIC INTERFEROMETRY FOR REAL-TIME MOLECULAR-BEAM EPITAXY PROCESS MONITORING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 1207-1210

Authors: BOBEL FG MOLLER H HERTEL B RITTER G CHOW P

Citation: Fg. Bobel et al., IN-SITU FILM-THICKNESS AND TEMPERATURE MONITOR, Solid state technology, 37(8), 1994, pp. 55