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Results:
1-11
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Results: 11
Authors:
BOUMERZOUG M
BOUDREAU M
MASCHER P
Citation: M. Boumerzoug et al., OPTICAL-EMISSION SPECTROSCOPY AS A REAL-TIME DIAGNOSTIC-TOOL FOR PLASMA-ASSISTED DEPOSITION OF TIN, Plasma chemistry and plasma processing, 17(2), 1997, pp. 181-192
Authors:
PUFF W
BOUMERZOUG M
BROWN J
MASCHER P
MACDONALD D
SIMPSON PJ
BALOGH AG
HAHN H
CHANG W
ROSE M
Citation: W. Puff et al., AN INVESTIGATION OF POINT-DEFECTS IN SILICON-CARBIDE, Applied physics A: Materials science & processing, 61(1), 1995, pp. 55-58
Authors:
WANG J
THOMPSON DA
SIMMONS JG
BOUMERZOUG M
BOUDREAU M
MASCHER P
Citation: J. Wang et al., THE EFFECT OF THE NATIVE-OXIDE ON MUSK UNDERCUTTING OF V-GROOVES ETCHED INTO (100) INP SURFACES USING AN SINX MASK, Journal of the Electrochemical Society, 142(2), 1995, pp. 593-596
Authors:
BOUMERZOUG M
PANG ZD
BOUDREAU M
MASCHER P
SIMMONS JG
Citation: M. Boumerzoug et al., ROOM-TEMPERATURE ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION OF HIGH-QUALITY TIN, Applied physics letters, 66(3), 1995, pp. 302-304
Authors:
BOUMERZOUG M
MASCHER P
SIMMONS JG
Citation: M. Boumerzoug et al., LOW-TEMPERATURE ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION OF VERY-LOW RESISTIVITY TIN FOR INP METALLIZATION USING METALORGANICPRECURSORS, Applied physics letters, 66(20), 1995, pp. 2664-2666
Authors:
PANG Z
BOUMERZOUG M
KRUZELECKY RV
MASCHER P
SIMMONS JG
THOMPSON DA
Citation: Z. Pang et al., LOW-TEMPERATURE RADIO-FREQUENCY SPUTTER-DEPOSITION OF TIN THIN-FILMS USING OPTICAL-EMISSION SPECTROSCOPY AS PROCESS MONITOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 83-89
Authors:
HALEC A
SCHULTZ PJ
BOUDREAU M
BOUMERZOUG M
MASCHER P
MCCAFFREY JP
JACKMAN TE
Citation: A. Halec et al., VOID FORMATION AT SILICON-NITRIDE SILICON INTERFACES STUDIED BY VARIABLE-ENERGY POSITRONS, Surface and interface analysis, 21(12), 1994, pp. 839-845
Authors:
BOUMERZOUG M
KRUZELECKY RV
MASCHER P
THOMPSON DA
Citation: M. Boumerzoug et al., IN-SITU MONITORING OF ELECTRON-CYCLOTRON-RESONANCE PLASMA CHEMICAL-VAPOR-DEPOSITION OF HYDROGENATED SILICON-NITRIDE FILMS, Surface & coatings technology, 59(1-3), 1993, pp. 77-81
Authors:
BOUDREAU M
BOUMERZOUG M
MASCHER P
JESSOP PE
Citation: M. Boudreau et al., ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION OF SILICON OXYNITRIDES USING TRIS(DIMETHYLAMINO)SILANE, Applied physics letters, 63(22), 1993, pp. 3014-3016
Authors:
PANG ZD
BOUMERZOUG M
KRUZELECKY RV
MASCHER P
SIMMONS JG
THOMPSON DA
Citation: Zd. Pang et al., ELECTRICAL CHARACTERIZATION OF RF-SPUTTERED TIN THIN-FILMS ON III-V SEMICONDUCTORS, Canadian journal of physics, 70(10-11), 1992, pp. 1076-1081
Authors:
BOUDREAU M
BOUMERZOUG M
KRUZELECKY RV
MASCHER P
JESSOP PE
THOMPSON DA
Citation: M. Boudreau et al., OPTICAL AND ELECTRICAL-PROPERTIES OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITED SINXH FILMS, Canadian journal of physics, 70(10-11), 1992, pp. 1104-1108
Risultati:
1-11
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