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Authors: BIJKERK F SHMAENOK LA SHEVELKO AP BASTIAENSEN RKFJ BRUINEMAN C VANHONK AGJR

Citation: F. Bijkerk et al., A HIGH-POWER, LOW-CONTAMINATION LASER-PLASMA SOURCE FOR EXTREME UV LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 299-301