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Results:
1-8
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Results: 8
Authors:
BUIE MJ
PENDER JTP
DAHIMENE M
Citation: Mj. Buie et al., CHARACTERIZATION OF THE ETCH RATE NONUNIFORMITY IN A MAGNETICALLY ENHANCED REACTIVE ION ETCHER, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1464-1468
Authors:
BROOKS CB
BUIE MJ
VAIDYA KJ
Citation: Cb. Brooks et al., PLASMA PROCESS-INDUCED SURFACE DAMAGE REMOVAL, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 260-264
Authors:
BUIE MJ
PENDER JTP
VENTZEK PLG
Citation: Mj. Buie et al., A METHOD FOR IDENTIFYING SOURCES OF REACTIVE ION ETCH LAG AND LOADINGIN A MAGNETICALLY ENHANCED REACTIVE ION ETCHER, JPN J A P 1, 36(7B), 1997, pp. 4838-4844
Authors:
BUIE MJ
JOSHI AM
REGIS J
Citation: Mj. Buie et al., THE ROLE OF N-2 IN ASPECT-RATIO-DEPENDENT ETCHING OF SIO2, Journal of the Electrochemical Society, 144(11), 1997, pp. 3935-3939
Authors:
BUIE MJ
PENDER JTP
HOLLOWAY JP
BRAKE ML
Citation: Mj. Buie et al., IN-SITU SENSOR OF SPATIALLY-RESOLVED OPTICAL-EMISSION, IEEE transactions on plasma science, 24(1), 1996, pp. 111-112
Authors:
BUIE MJ
PENDER JTP
HOLLOWAY JP
VINCENT T
VENTZEK PLG
BRAKE ML
Citation: Mj. Buie et al., ABELS INVERSION APPLIED TO EXPERIMENTAL SPECTROSCOPIC DATA WITH OFF-AXIS PEAKS, Journal of quantitative spectroscopy & radiative transfer, 55(2), 1996, pp. 231-243
Authors:
BRAKE ML
PENDER JTP
BUIE MJ
RICCI A
SONIKER J
Citation: Ml. Brake et al., REACTIVE ION ETCHING IN THE GASEOUS ELECTRONICS CONFERENCE RF REFERENCE CELL, Journal of research of the National Institute of Standards and Technology, 100(4), 1995, pp. 441-448
Authors:
BUIE MJ
PENDER JT
SONIKER J
BRAKE ML
ELTA M
Citation: Mj. Buie et al., IN-SITU DIAGNOSTIC FOR ETCH UNIFORMITY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(4), 1995, pp. 1930-1934
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1-8
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