Authors:
GONG SS
BURNHAM ME
THEODORE ND
SCHRODER DK
Citation: Ss. Gong et al., EVALUATION OF Q(BD) FOR ELECTRONS TUNNELING FROM THE SI SIO2 INTERFACE COMPARED TO ELECTRON-TUNNELING FROM THE POLY-SI/SIO2 INTERFACE/, I.E.E.E. transactions on electron devices, 40(7), 1993, pp. 1251-1257