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Results:
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Results: 2
Pre-alloying implants with indium as an enabling technology to extend titanium salicide towards 0.1-mu m linewidths
Authors:
Gerritsen, E Basso, MT Baylac, B
Citation:
E. Gerritsen et al., Pre-alloying implants with indium as an enabling technology to extend titanium salicide towards 0.1-mu m linewidths, MICROEL ENG, 50(1-4), 2000, pp. 117-123
Developing a 0.18-micron CMOS process
Authors:
Haond, M Basso, MT deCoster, W Gerritsen, E Guelen, J Lair, C
Citation:
M. Haond et al., Developing a 0.18-micron CMOS process, IEEE MICRO, 19(5), 1999, pp. 16-22
Risultati:
1-2
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