Authors:
Hu, JM
Deng, T
Beck, RG
Westervelt, RM
Maranowski, KD
Gossard, AC
Whitesides, GM
Citation: Jm. Hu et al., Fabrication of GaAs/AlGaAs high electron mobility transistors with 250 nm gates using conformal phase shift lithography, SENS ACTU-A, 86(1-2), 2000, pp. 122-126