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Results: 1-10 |
Results: 10
High quality thin oxynitride by RTP annealing of in situ steam generation oxides for flash memory applications
Authors: Brazzelli, D Ghidini, G Crivelli, B Zonca, R Bersani, M
Citation: D. Brazzelli et al., High quality thin oxynitride by RTP annealing of in situ steam generation oxides for flash memory applications, SOL ST ELEC, 45(8), 2001, pp. 1271-1278
The impact of the nitridation process on the properties of the Si-SiO2 interface
Authors: Polignano, ML Alessandri, M Crivelli, B Zonca, R Caricato, AP Bersani, M Sbetti, M Vanzetti, L
Citation: Ml. Polignano et al., The impact of the nitridation process on the properties of the Si-SiO2 interface, J NON-CRYST, 280(1-3), 2001, pp. 39-47
Effects of boron-interstitial silicon clusters on interstitial supersaturation during postimplantation annealing
Authors: Solmi, S Mancini, L Milita, S Servidori, M Mannino, G Bersani, M
Citation: S. Solmi et al., Effects of boron-interstitial silicon clusters on interstitial supersaturation during postimplantation annealing, APPL PHYS L, 79(8), 2001, pp. 1103-1105
Electrical activation of B in the presence of boron-interstitials clusters
Authors: Mannino, G Solmi, S Privitera, V Bersani, M
Citation: G. Mannino et al., Electrical activation of B in the presence of boron-interstitials clusters, APPL PHYS L, 79(23), 2001, pp. 3764-3766
XPS and SIMS depth profiling of oxynitrides
Authors: Vanzetti, L Bersani, M Sbetti, M Anderle, M
Citation: L. Vanzetti et al., XPS and SIMS depth profiling of oxynitrides, SURF INT AN, 30(1), 2000, pp. 255-259
Electrical characterisation of oxides grown in different RTP ambients
Authors: Brazzelli, D Ghidini, G Crivelli, B Zonca, R Bersani, M Xing, GC Miner, GE D'Astici, N Kuppurao, S Lopes, D
Citation: D. Brazzelli et al., Electrical characterisation of oxides grown in different RTP ambients, MICROEL REL, 40(4-5), 2000, pp. 641-644
Boron-interstitial silicon clusters and their effects on transient enhanced diffusion of boron in silicon
Authors: Solmi, S Bersani, M Sbetti, M Hansen, JL Larsen, AN
Citation: S. Solmi et al., Boron-interstitial silicon clusters and their effects on transient enhanced diffusion of boron in silicon, J APPL PHYS, 88(8), 2000, pp. 4547-4552
Effects of donor concentration on transient enhanced diffusion of boron insilicon
Authors: Solmi, S Bersani, M
Citation: S. Solmi et M. Bersani, Effects of donor concentration on transient enhanced diffusion of boron insilicon, J APPL PHYS, 87(8), 2000, pp. 3696-3699
Characterization of rapid thermal processing oxynitrides by SIMS and XPS analyses
Authors: Bersani, M Vanzetti, L Sbetti, M Anderle, M
Citation: M. Bersani et al., Characterization of rapid thermal processing oxynitrides by SIMS and XPS analyses, APPL SURF S, 145, 1999, pp. 301-305
Co-operative study of residues in drinking water: Public health laboratories - Region of Lombardy - Italy
Authors: Ceriani, D Maroni, M Basla, R Bersani, M Sesana, G Carreri, V
Citation: D. Ceriani et al., Co-operative study of residues in drinking water: Public health laboratories - Region of Lombardy - Italy, HUMAN AND ENVIRONMENTAL EXPOSURE TO XENOBIOTICS, 1999, pp. 245-248
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