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Results: 1-11 |
Results: 11
Nanolithography in the evanescent near field
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ
Citation: Mm. Alkaisi et al., Nanolithography in the evanescent near field, ADVAN MATER, 13(12-13), 2001, pp. 877
Low temperature nanoimprint lithography using silicon nitride molds
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ
Citation: Mm. Alkaisi et al., Low temperature nanoimprint lithography using silicon nitride molds, MICROEL ENG, 57-8, 2001, pp. 367-373
Variable polarisation compensator using artificial dielectrics for millimetre and submillimetre waves
Authors: Drysdale, TD Chong, HMH Blaikie, RJ Cumming, DRS
Citation: Td. Drysdale et al., Variable polarisation compensator using artificial dielectrics for millimetre and submillimetre waves, ELECTR LETT, 37(3), 2001, pp. 149-150
Evanescent interferometric lithography
Authors: Blaikie, RJ McNab, SJ
Citation: Rj. Blaikie et Sj. Mcnab, Evanescent interferometric lithography, APPL OPTICS, 40(10), 2001, pp. 1692-1698
Analytic study of gratings patterned by evanescent near field optical lithography
Authors: McNab, SJ Blaikie, RJ Alkaisi, MM
Citation: Sj. Mcnab et al., Analytic study of gratings patterned by evanescent near field optical lithography, J VAC SCI B, 18(6), 2000, pp. 2900-2904
70 nm features on 140 nm period using Evanescent Near Field Optical Lithography
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ
Citation: Mm. Alkaisi et al., 70 nm features on 140 nm period using Evanescent Near Field Optical Lithography, MICROEL ENG, 53(1-4), 2000, pp. 237-240
Contrast in the evanescent near field of lambda/20 period gratings for photolithography
Authors: McNab, SJ Blaikie, RJ
Citation: Sj. Mcnab et Rj. Blaikie, Contrast in the evanescent near field of lambda/20 period gratings for photolithography, APPL OPTICS, 39(1), 2000, pp. 20-25
Nanolithography using optical contact exposure in the evanescent near field
Authors: Blaikie, RJ Alkaisi, MM McNab, SJ Cumming, DRS Cheung, R Hasko, DG
Citation: Rj. Blaikie et al., Nanolithography using optical contact exposure in the evanescent near field, MICROEL ENG, 46(1-4), 1999, pp. 85-88
A variable polarisation compensator using artificial dielectrics
Authors: Cumming, DRS Blaikie, RJ
Citation: Drs. Cumming et Rj. Blaikie, A variable polarisation compensator using artificial dielectrics, OPT COMMUN, 163(4-6), 1999, pp. 164-168
Sub-diffraction-limited patterning using evanescent near-field optical lithography
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ Cheung, R Cumming, DRS
Citation: Mm. Alkaisi et al., Sub-diffraction-limited patterning using evanescent near-field optical lithography, APPL PHYS L, 75(22), 1999, pp. 3560-3562
Nanolithography using wet etched silicon nitride phase mass
Authors: Alkaisi, MM Blaikie, RJ McNab, SJ
Citation: Mm. Alkaisi et al., Nanolithography using wet etched silicon nitride phase mass, J VAC SCI B, 16(6), 1998, pp. 3929-3933
Risultati: 1-11 |