Citation: M. Switkes et al., Patterning of sub-50 nm dense features with space-invariant 157 nm interference lithography, APPL PHYS L, 77(20), 2000, pp. 3149-3151
Authors:
Rothschild, M
Bloomstein, TM
Curtin, JE
Downs, DK
Fedynyshyn, TH
Hardy, DE
Kunz, RR
Liberman, V
Sedlacek, JHC
Uttaro, RS
Bates, AK
Van Peski, C
Citation: M. Rothschild et al., 157 nm: Deepest deep-ultraviolet yet, J VAC SCI B, 17(6), 1999, pp. 3262-3266