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Results:
1-7
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Results: 7
Authors:
Bates, AK
Rothschild, M
Bloomstein, TM
Fedynyshyn, TH
Kunz, RR
Liberman, V
Switkes, M
Citation: Ak. Bates et al., Review of technology for 157-nm lithography, IBM J RES, 45(5), 2001, pp. 605-614
Authors:
Switkes, M
Bloomstein, TM
Rothschild, M
Citation: M. Switkes et al., Patterning of sub-50 nm dense features with space-invariant 157 nm interference lithography, APPL PHYS L, 77(20), 2000, pp. 3149-3151
Authors:
Rothschild, M
Bloomstein, TM
Curtin, JE
Downs, DK
Fedynyshyn, TH
Hardy, DE
Kunz, RR
Liberman, V
Sedlacek, JHC
Uttaro, RS
Bates, AK
Van Peski, C
Citation: M. Rothschild et al., 157 nm: Deepest deep-ultraviolet yet, J VAC SCI B, 17(6), 1999, pp. 3262-3266
Authors:
Kunz, RR
Bloomstein, TM
Hardy, DE
Goodman, RB
Downs, DK
Curtin, JE
Citation: Rr. Kunz et al., Outlook for 157 nm resist design, J VAC SCI B, 17(6), 1999, pp. 3267-3272
Authors:
Liberman, V
Bloomstein, TM
Rothschild, M
Sedlacek, JHC
Uttaro, RS
Bates, AK
Van Peski, C
Orvek, K
Citation: V. Liberman et al., Materials issues for optical components and photomasks in 157 nm lithography, J VAC SCI B, 17(6), 1999, pp. 3273-3279
Authors:
Young, AM
Bloomstein, TM
Palmacci, ST
Citation: Am. Young et al., Contoured elastic-membrane microvalves for microfluidic network integration, J BIOMECH E, 121(1), 1999, pp. 2-6
Authors:
Bloomstein, TM
Rothschild, M
Kunz, RR
Hardy, DE
Goodman, RB
Palmacci, ST
Citation: Tm. Bloomstein et al., Critical issues in 157 nm lithography, J VAC SCI B, 16(6), 1998, pp. 3154-3157
Risultati:
1-7
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