Citation: Kv. Smith et al., Local electronic properties of AlGaN/GaN heterostructures probed by scanning capacitance microscopy, J ELEC MAT, 29(3), 2000, pp. 274-280
Authors:
Hashizume, T
Alekseev, E
Pavlidis, D
Boutros, KS
Redwing, J
Citation: T. Hashizume et al., Capacitance-voltage characterization of AlN/GaN metal-insulator-semiconductor structures grown on sapphire substrate by metalorganic chemical vapor deposition, J APPL PHYS, 88(4), 2000, pp. 1983-1986
Authors:
Li, R
Cai, SJ
Wong, L
Chen, Y
Wang, KL
Smith, RP
Martin, SC
Boutros, KS
Redwing, JM
Citation: R. Li et al., An Al0.3Ga0.7N/GaN undoped channel heterostructure field effect transistorwith F-max of 107 GHz, IEEE ELEC D, 20(7), 1999, pp. 323-325
Authors:
Dang, XZ
Asbeck, PM
Yu, ET
Sullivan, GJ
Chen, MY
McDermott, BT
Boutros, KS
Redwing, JM
Citation: Xz. Dang et al., Measurement of drift mobility in AlGaN GaN heterostructure field-effect transistor, APPL PHYS L, 74(25), 1999, pp. 3890-3892
Authors:
Yu, LS
Xing, QJ
Qiao, D
Lau, SS
Boutros, KS
Redwing, JM
Citation: Ls. Yu et al., Internal photoemission measurement of Schottky barrier height for Ni on AlGaN/GaN heterostructure, APPL PHYS L, 73(26), 1998, pp. 3917-3919