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Results: 1-25 | 26-38 |
Results: 26-38/38
Measurement and modeling of the annealing kinetics of stress induced leakage current in ultra-thin oxides
Authors: Riess, P Ghibaudo, G Pananakakis, G Brini, J
Citation: P. Riess et al., Measurement and modeling of the annealing kinetics of stress induced leakage current in ultra-thin oxides, MICROEL REL, 39(2), 1999, pp. 203-207
Electric field and temperature dependence of the stress induced leakage current: Fowler-Nordheim or Schottky emission?
Authors: Riess, P Ghibaudo, G Pananakakis, G Brini, J Ghidini, G
Citation: P. Riess et al., Electric field and temperature dependence of the stress induced leakage current: Fowler-Nordheim or Schottky emission?, J NON-CRYST, 245, 1999, pp. 48-53
Electrical properties of oxynitride thin films using noise and charge pumping measurements
Authors: Masson, P Morfouli, P Autran, JL Brini, J Balland, B Vogel, EM Wortman, JJ
Citation: P. Masson et al., Electrical properties of oxynitride thin films using noise and charge pumping measurements, J NON-CRYST, 245, 1999, pp. 54-58
Effect of excimer laser annealing on the structural and electrical properties of polycrystalline silicon thin-film transistors
Authors: Angelis, CT Dimitriadis, CA Miyasaka, M Farmakis, FV Kamarinos, G Brini, J Stoemenos, J
Citation: Ct. Angelis et al., Effect of excimer laser annealing on the structural and electrical properties of polycrystalline silicon thin-film transistors, J APPL PHYS, 86(8), 1999, pp. 4600-4606
Dimension scaling of low frequency noise in the drain current of polycrystalline silicon thin-film transistors
Authors: Angelis, CT Dimitriadis, CA Farmakis, FV Brini, J Kamarinos, G Miyasaka, M
Citation: Ct. Angelis et al., Dimension scaling of low frequency noise in the drain current of polycrystalline silicon thin-film transistors, J APPL PHYS, 86(12), 1999, pp. 7083-7086
Photon emission and related hot-carrier effects in polycrystalline siliconthin-film transistors
Authors: Farmakis, FV Dimitriadis, CA Brini, J Kamarinos, G Gueorguiev, VK Ivanov, TE
Citation: Fv. Farmakis et al., Photon emission and related hot-carrier effects in polycrystalline siliconthin-film transistors, J APPL PHYS, 85(9), 1999, pp. 6917-6919
Low-frequency noise in polycrystalline semiconducting FeSi2 thin films
Authors: Tassis, DH Dimitriadis, CA Brini, J Kamarinos, G Birbas, A
Citation: Dh. Tassis et al., Low-frequency noise in polycrystalline semiconducting FeSi2 thin films, J APPL PHYS, 85(8), 1999, pp. 4091-4095
Characteristics of TiNx/n-Si Schottky diodes deposited by reactive magnetron sputtering
Authors: Dimitriadis, CA Lee, JI Patsalas, P Logothetidis, S Tassis, DH Brini, J Kamarinos, G
Citation: Ca. Dimitriadis et al., Characteristics of TiNx/n-Si Schottky diodes deposited by reactive magnetron sputtering, J APPL PHYS, 85(8), 1999, pp. 4238-4242
1/f(gamma) noise in polycrystalline silicon thin-film transistors
Authors: Dimitriadis, CA Brini, J Lee, JI Farmakis, FV Kamarinos, G
Citation: Ca. Dimitriadis et al., 1/f(gamma) noise in polycrystalline silicon thin-film transistors, J APPL PHYS, 85(7), 1999, pp. 3934-3936
Low-frequency noise spectroscopy of polycrystalline silicon thin-film transistors
Authors: Angelis, CT Dimitriadis, CA Brini, J Kamarinos, G Gueorguiev, VK Ivanov, TE
Citation: Ct. Angelis et al., Low-frequency noise spectroscopy of polycrystalline silicon thin-film transistors, IEEE DEVICE, 46(5), 1999, pp. 968-974
Electrical and noise properties of thin-film transistors on very thin excimer laser annealed polycrystalline silicon films
Authors: Angelis, CT Dimitriadis, CA Farmakis, FV Kamarinos, G Brini, J Miyasaka, M
Citation: Ct. Angelis et al., Electrical and noise properties of thin-film transistors on very thin excimer laser annealed polycrystalline silicon films, APPL PHYS L, 74(24), 1999, pp. 3684-3686
Avalanche-induced excess noise in polycrystalline silicon thin-film transistors
Authors: Dimitriadis, CA Kamarinos, G Brini, J Evangelou, EK Gueorguiev, VK
Citation: Ca. Dimitriadis et al., Avalanche-induced excess noise in polycrystalline silicon thin-film transistors, APPL PHYS L, 74(1), 1999, pp. 108-110
Interface state generation during electrical stress in n-channel undoped hydrogenated polysilicon thin-film transistors
Authors: Farmakis, FV Dimitriadis, CA Brini, J Kamarinos, G Gueorguiev, VK Ivanov, TE
Citation: Fv. Farmakis et al., Interface state generation during electrical stress in n-channel undoped hydrogenated polysilicon thin-film transistors, ELECTR LETT, 34(24), 1998, pp. 2356-2357
Risultati: 1-25 | 26-38 |