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Results: 1-13 |
Results: 13
RECORDING OF RELIEF STRUCTURES IN AMORPHOUS HYDROGENATED CARBON (A-C-H) FILMS FOR INFRARED DIFFRACTIVE OPTICS
Authors: SOARES LL LIMA CRA CESCATO L ALVES MAR BRAGA ES
Citation: Ll. Soares et al., RECORDING OF RELIEF STRUCTURES IN AMORPHOUS HYDROGENATED CARBON (A-C-H) FILMS FOR INFRARED DIFFRACTIVE OPTICS, J. mod. opt., 45(7), 1998, pp. 1479-1486
OPTICAL-EMISSION END-POINT DETECTING FOR MONITORING OXYGEN PLASMA A-C-H STRIPPING
Authors: ALVES MAR BRAGA ED FISSORE A CESCATO L
Citation: Mar. Alves et al., OPTICAL-EMISSION END-POINT DETECTING FOR MONITORING OXYGEN PLASMA A-C-H STRIPPING, Vacuum, 49(3), 1998, pp. 213-215
SELECTIVE-AREA DEPOSITION OF A-C-H FILMS AS MASKS FOR ANISOTROPIC ETCHING OF CRYSTALLINE SILICON IN AQUEOUS POTASSIUM HYDROXIDE
Authors: FISSORE A ALVES MAR BRAGA ED CESCATO L
Citation: A. Fissore et al., SELECTIVE-AREA DEPOSITION OF A-C-H FILMS AS MASKS FOR ANISOTROPIC ETCHING OF CRYSTALLINE SILICON IN AQUEOUS POTASSIUM HYDROXIDE, Vacuum, 49(1), 1998, pp. 49-50
REFLECTING POLARIZING BEAM SPLITTER
Authors: LIMA CRA SOARES LL CESCATO L GOBBI AL
Citation: Cra. Lima et al., REFLECTING POLARIZING BEAM SPLITTER, Optics letters, 22(4), 1997, pp. 203-205
DIFFRACTIVE STRUCTURES HOLOGRAPHICALLY RECORDED IN AMORPHOUS HYDROGENATED CARBON (A-C-H) FILMS
Authors: LIMA CRA SOARES LL CESCATO L ALVES MAR BRAGA ES
Citation: Cra. Lima et al., DIFFRACTIVE STRUCTURES HOLOGRAPHICALLY RECORDED IN AMORPHOUS HYDROGENATED CARBON (A-C-H) FILMS, Optics letters, 22(23), 1997, pp. 1805-1807
FRINGE STABILIZATION AND DEPTH MONITORING DURING THE HOLOGRAPHIC PHOTOELECTROCHEMICAL ETCHING OF N-INP(100) SUBSTRATES
Authors: SOLTZ D DEPAOLI MA CESCATO L
Citation: D. Soltz et al., FRINGE STABILIZATION AND DEPTH MONITORING DURING THE HOLOGRAPHIC PHOTOELECTROCHEMICAL ETCHING OF N-INP(100) SUBSTRATES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 1784-1790
ELECTRICAL CHARACTERISTICS OF AL A-C-H/N-SI DIODES USING CH4 AND CH4/CF4 AS THE GAS-SOURCE/
Authors: ALVES MAR BRAGA ES FREJLICH J CESCATO L
Citation: Mar. Alves et al., ELECTRICAL CHARACTERISTICS OF AL A-C-H/N-SI DIODES USING CH4 AND CH4/CF4 AS THE GAS-SOURCE/, Vacuum, 47(3), 1996, pp. 225-227
EFFECTS OF DAMPING ON PHONON FREQUENCY IN ZNSE
Authors: ALVES MAR BRAGA ES FREJLICH J CESCATO L
Citation: Mar. Alves et al., EFFECTS OF DAMPING ON PHONON FREQUENCY IN ZNSE, Vacuum, 47(3), 1996, pp. 251-253
POTENTIAL-INDUCED CHANGES IN THE SURFACE-MORPHOLOGY OF (100)N-INP SAMPLES PHOTOELECTROCHEMICALLY ETCHED
Authors: SOLTZ D CESCATO L
Citation: D. Soltz et L. Cescato, POTENTIAL-INDUCED CHANGES IN THE SURFACE-MORPHOLOGY OF (100)N-INP SAMPLES PHOTOELECTROCHEMICALLY ETCHED, Journal of the Electrochemical Society, 143(9), 1996, pp. 2815-2821
AN MIS DIODE EMPLOYING A-C-H FILM AS THE INSULATOR
Authors: ALVES MAR BRAGA ES FREJLICH J CESCATO L
Citation: Mar. Alves et al., AN MIS DIODE EMPLOYING A-C-H FILM AS THE INSULATOR, Vacuum, 46(12), 1995, pp. 1461-1463
EVOLUTION OF SURFACE TEXTURES ON N-INP SAMPLES ETCHED PHOTOELECTROCHEMICALLY (VOL 142, PG 1348, 1995)
Authors: FERREIRA NG SOLTZ D DECKER F CESCATO L
Citation: Ng. Ferreira et al., EVOLUTION OF SURFACE TEXTURES ON N-INP SAMPLES ETCHED PHOTOELECTROCHEMICALLY (VOL 142, PG 1348, 1995), Journal of the Electrochemical Society, 142(9), 1995, pp. 91-91
EVOLUTION OF SURFACE TEXTURES ON N-INP SAMPLES ETCHED PHOTOELECTROCHEMICALLY
Authors: FERREIRA NG SOLTZ D DECKER F CESCATO L
Citation: Ng. Ferreira et al., EVOLUTION OF SURFACE TEXTURES ON N-INP SAMPLES ETCHED PHOTOELECTROCHEMICALLY, Journal of the Electrochemical Society, 142(4), 1995, pp. 1348-1352
DEVELOPED PROFILE OF HOLOGRAPHICALLY EXPOSED PHOTORESIST GRATINGS
Authors: MELLO BD DACOSTA IF LIMA CRA CESCATO L
Citation: Bd. Mello et al., DEVELOPED PROFILE OF HOLOGRAPHICALLY EXPOSED PHOTORESIST GRATINGS, Applied optics, 34(4), 1995, pp. 597-603
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