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Results:
1-24
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Results: 24
Authors:
CHOI SS
KIM JS
CHUNG HB
YOO HJ
KIM BW
Citation: Ss. Choi et al., ELECTRON-BEAM DAMAGE IN THE SIN MEMBRANE OF AN X-RAY-LITHOGRAPHY MASK, JPN J A P 1, 37(1), 1998, pp. 360-363
Authors:
LEE HY
CHUNG HB
Citation: Hy. Lee et Hb. Chung, DRY-ETCHING DEVELOPMENT CHARACTERISTICS OF SE75GE25 RESIST FOR FOCUSED-ION-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 1987-1991
Authors:
LEE HY
CHUNG HB
Citation: Hy. Lee et Hb. Chung, GA-ION-BEAM EXPOSURE AND CF4 REACTIVE-ION-ETCHING DEVELOPMENT OF SI3N4 RESIST OPTIMIZED BY MONTE-CARLO SIMULATION( FOCUSED), Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1161-1166
Authors:
KIM JS
CHUNG HB
YOO HJ
KIM BW
Citation: Js. Kim et al., 2-WAVELENGTH ANTIREFLECTION COATING FOR ARF EXCIMER-LASER LITHOGRAPHYOPTICS, Journal of the Korean Physical Society, 33(2), 1998, pp. 136-142
Authors:
CHOI SS
KIM JS
DIFABRIZIO E
GENTILI M
CHUNG HB
YOO HJ
KIM BW
Citation: Ss. Choi et al., A NOVEL X-RAY MASK FOR MIX-AND-MATCH OF OPTICAL AND X-RAY-LITHOGRAPHYAPPLIED IN SOI DEVICE FABRICATION, Journal of the Korean Physical Society, 32(5), 1998, pp. 727-730
Authors:
KIM DH
KIM JS
LEE KH
CHOI SS
CHUNG HB
YOO HJ
KIM BW
Citation: Dh. Kim et al., SMALL-FIELD EXPOSURE SYSTEM FOR 193-NM LITHOGRAPHY, Journal of the Korean Physical Society, 32(4), 1998, pp. 486-490
Authors:
LEE H
CHUNG HB
Citation: H. Lee et Hb. Chung, THE CHARACTERISTICS OF AN AMORPHOUS SE75GE25 THIN-FILM AS A POSITIVE-TYPE RESIST IN FOCUSED-ION-BEAM LITHOGRAPHY, Journal of the Korean Physical Society, 32(2), 1998, pp. 171-175
Authors:
LEE HY
PARK SH
CHUN JY
CHUNG HB
Citation: Hy. Lee et al., PHOTOINDUCED TRANSFORMATIONS IN AMORPHOUS SE75GE25 THIN-FILM BY XECL EXCIMER-LASER EXPOSURE, Journal of applied physics, 83(10), 1998, pp. 5381-5385
Authors:
CHUNG HB
Citation: Hb. Chung, FEMALE LABORERS AND THE WOMENS LABOR-MOVEMENT IN SOUTH-KOREA DURING THE 1970S, Beitrage zur Geschichte der Arbeiterbewegung, 40(2), 1998, pp. 43-60
Authors:
JHUN Y
KIM S
LEE S
CHUNG HB
YOO HJ
Citation: Y. Jhun et al., CORRELATION OF THE VECTOR DIFFRACTION EFFECT ON THE OPTICAL LITHOGRAPHIC IMAGE OF A BINARY MASK WITH MAGNIFICATION OF THE PROJECTION SYSTEM, Applied optics, 37(13), 1998, pp. 2542-2549
Authors:
LEE HY
CHUNG HB
Citation: Hy. Lee et Hb. Chung, AMORPHOUS SE75GE25 RESIST PROFILE SIMULATION OF FOCUSED-ION-BEAM LITHOGRAPHY, JPN J A P 1, 36(4A), 1997, pp. 2409-2414
Authors:
LEE HY
CHUNG HB
Citation: Hy. Lee et Hb. Chung, LOW-ENERGY FOCUSED-ION-BEAM EXPOSURE CHARACTERISTICS OF AN AMORPHOUS SE75GE25 RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 818-822
Authors:
CHUNG HB
LEE KH
KIM DH
YOO HJ
Citation: Hb. Chung et al., DESIGN AND TOLERANCING OF ARF EXCIMER-LASER OPTICS FOR LITHOGRAPHY, Journal of the Korean Physical Society, 30(3), 1997, pp. 534-539
Authors:
DIFABRIZIO E
GRELLA L
GENTILI M
BACIOCCHI M
MASTROGIACOMO L
CHOI SS
JEON YJ
YOO HJ
CHUNG HB
Citation: E. Difabrizio et al., A NOVEL X-RAY MASK CONCEPT FOR MIX-AND-MATCH LITHOGRAPHY FABRICATION OF MOS DEVICES BY SYNCHROTRON-RADIATION LITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 553-556
Authors:
NO JS
YANG KC
CHUNG HB
SONG HY
Citation: Js. No et al., NEW CONSTRUCTION FOR FAMILIES OF BINARY SEQUENCES WITH OPTIMAL CORRELATION-PROPERTIES, IEEE transactions on information theory, 43(5), 1997, pp. 1596-1602
Authors:
YIM D
LEE S
LEE S
OH YH
CHUNG HB
YOO HJ
Citation: D. Yim et al., EFFECT OF DEGREE OF COHERENCE IN OPTICAL LITHOGRAPHY USING DUMMY DIFFRACTION MASK, JPN J A P 1, 35(2A), 1996, pp. 780-785
Authors:
CHUNG HB
LEE KH
YOO KJ
Citation: Hb. Chung et al., CATADIOPTRIC SYSTEM-DESIGN FOR ARF EXCIMER-LASER LITHOGRAPHY, Journal of the Korean Physical Society, 29(3), 1996, pp. 305-309
Authors:
KIM DH
PARK BS
CHUNG HB
LEE JH
YOO HJ
OH YH
Citation: Dh. Kim et al., KRF EXCIMER-LASER LITHOGRAPHY WITH A DUMMY DIFFRACTION MASK, Journal of the Korean Physical Society, 29(3), 1996, pp. 317-320
Authors:
BACIOCCHI M
DIFABRIZIO E
GENTILI M
GRELLA L
MAGGIORA L
MASTROGIACOMO L
PESCHIAROLI D
CHOI S
JEON YJ
CHUNG HB
YOO HJ
Citation: M. Baciocchi et al., EXPOSURE LATITUDE AND CD CONTROL STUDY FOR ADDITIVELY PATTERNED X-RAYMASK WITH GBIT DRAM COMPLEXITY, Microelectronic engineering, 30(1-4), 1996, pp. 195-198
Authors:
NO JS
LEE HK
CHUNG HB
SONG HY
YANG K
Citation: Js. No et al., TRACE REPRESENTATION OF LEGENDRE SEQUENCES OF MERSENNE PRIME PERIOD, IEEE transactions on information theory, 42(6), 1996, pp. 2254-2255
Authors:
LEE HY
CHUNG HB
Citation: Hy. Lee et Hb. Chung, MONTE-CARLO SIMULATION OF FOCUSED ION-BEAM LITHOGRAPHY IN INORGANIC RESIST, Synthetic metals, 71(1-3), 1995, pp. 2047-2048
Authors:
CHOI SS
LEE JH
YOON HS
CHUNG HB
LEE SY
YOO HJ
Citation: Ss. Choi et al., FABRICATION OF A 0.1-MU-M T-SHAPED GATE WITH WIDE HEAD FOR SUPER LOW-NOISE HEMTS, Journal of the Korean Physical Society, 28(6), 1995, pp. 768-772
Authors:
LEE HY
CHUNG HB
Citation: Hy. Lee et Hb. Chung, 3-DIMENSIONAL MONTE-CARLO CALCULATION OF GA-SE75GE25 THIN-FILM( ION PENETRATION IN AN A), Journal of applied physics, 78(10), 1995, pp. 5975-5980
Authors:
SHIM CS
CHUNG HB
Citation: Cs. Shim et Hb. Chung, ON THE 2ND GENERALIZED HAMMING WEIGHT OF THE DUAL CODE OF A DOUBLE-ERROR-CORRECTING BINARY BCH CODE, IEEE transactions on information theory, 41(3), 1995, pp. 805-808
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