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Results:
1-20
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Results: 20
Authors:
WEBER SJ
IGGULDEN RC
SCHNABEL RF
WEIGAND P
RESTAINO DD
BRODSKY SB
MEHTER EA
CLEVENGER LA
Citation: Sj. Weber et al., TEMPERATURE-DEPENDENCE OF THE AL-FILL PROCESSES FOR SUBMICRON-VIA STRUCTURES, Thin solid films, 320(1), 1998, pp. 63-66
Authors:
CLEVENGER LA
ARCOT B
ZIEGLER W
COLGAN EG
HONG QZ
DHEURLE FM
CABRAL C
GALLO TA
HARPER JME
Citation: La. Clevenger et al., INTERDIFFUSION AND PHASE-FORMATION IN CU(SN) ALLOY-FILMS, Journal of applied physics, 83(1), 1998, pp. 90-99
Authors:
HURD JL
RODBELL KP
GIGNAC LM
CLEVENGER LA
IGGULDEN RC
SCHNABEL RF
WEBER SJ
SCHMIDT NH
Citation: Jl. Hurd et al., LINEWIDTH AND UNDERLAYER INFLUENCE ON TEXTURE IN SUBMICROMETER-WIDE AL AND ALCU LINES, Applied physics letters, 72(3), 1998, pp. 326-328
Authors:
CABRAL C
CLEVENGER LA
HARPER JME
DHEURLE FM
ROY RA
SAENGER KL
MILES GL
MANN RW
Citation: C. Cabral et al., LOWERING THE FORMATION TEMPERATURE OF THE C54-TISI2 PHASE USING A METALLIC INTERFACIAL LAYER, Journal of materials research, 12(2), 1997, pp. 304-307
Authors:
SVILAN V
RODBELL KP
CLEVENGER LA
CABRAL C
ROY RA
LAVOIE C
JORDANSWEET J
HARPER JME
Citation: V. Svilan et al., CRYSTALLOGRAPHIC TEXTURE OF C54 TITANIUM DISILICIDE AS A FUNCTION OF DEEP-SUBMICRON STRUCTURE GEOMETRY, Journal of electronic materials, 26(9), 1997, pp. 1090-1095
Authors:
CABRAL C
CLEVENGER LA
HARPER JME
DHEURLE FM
ROY RA
LAVOIE C
SAENGER KL
MILES GL
MANN RW
NAKOS JS
Citation: C. Cabral et al., LOW-TEMPERATURE FORMATION OF C54-TISI2 USING TITANIUM-ALLOYS, Applied physics letters, 71(24), 1997, pp. 3531-3533
Authors:
CLEVENGER LA
CABRAL C
ROY RA
LAVOIE C
JORDANSWEET J
BRAUER S
MORALES G
LUDWIG KF
STEPHENSON GB
Citation: La. Clevenger et al., FORMATION OF A CRYSTALLINE METAL-RICH SILICIDE IN THIN-FILM TITANIUM SILICON REACTIONS/, Thin solid films, 289(1-2), 1996, pp. 220-226
Authors:
CLEVENGER LA
ROY RA
CABRAL C
SAENGER KL
BRAUER S
MORALES G
LUDWIG KF
GIFFORD G
BUCCHIGNANO J
JORDANSWEET J
DEHAVEN P
STEPHENSON GB
Citation: La. Clevenger et al., A COMPARISON OF C54-TISI2 FORMATION IN BLANKET AND SUBMICRON GATE STRUCTURES USING IRT SITU X-RAY-DIFFRACTION DURING RAPID THERMAL ANNEALING, Journal of materials research, 10(9), 1995, pp. 2355-2359
Authors:
SAENGER KL
CABRAL C
CLEVENGER LA
ROY RA
WIND S
Citation: Kl. Saenger et al., A KINETIC-STUDY OF THE C49 TO C54 TISI2 CONVERSION USING ELECTRICAL-RESISTIVITY MEASUREMENTS ON SINGLE NARROW LINES, Journal of applied physics, 78(12), 1995, pp. 7040-7044
Authors:
SAENGER KL
CABRAL C
CLEVENGER LA
ROY RA
Citation: Kl. Saenger et al., INVESTIGATION OF TITANIUM SILICIDE FORMATION IN TI-SPECTROSCOPY AND X-RAY-DIFFRACTION(SI REACTIONS USING INFRARED), Journal of applied physics, 77(10), 1995, pp. 5156-5159
Authors:
MANN RW
CLEVENGER LA
AGNELLO PD
WHITE FR
Citation: Rw. Mann et al., SILICIDES AND LOCAL INTERCONNECTIONS FOR HIGH-PERFORMANCE VLSI APPLICATIONS, IBM journal of research and development, 39(4), 1995, pp. 403-417
Authors:
MANN RW
MILES GL
KNOTTS TA
RAKOWSKI DW
CLEVENGER LA
HARPER JME
DHEURLE FM
CABRAL C
Citation: Rw. Mann et al., REDUCTION OF THE C54-TISI2 PHASE-TRANSFORMATION TEMPERATURE USING REFRACTORY-METAL ION-IMPLANTATION, Applied physics letters, 67(25), 1995, pp. 3729-3731
Authors:
ROY RA
CLEVENGER LA
CABRAL C
SAENGER KL
BRAUER S
JORDANSWEET J
BUCCHIGNANO J
STEPHENSON GB
MORALES G
LUDWIG KF
Citation: Ra. Roy et al., IN-SITU X-RAY-DIFFRACTION ANALYSIS OF THE C49-C54 TITANIUM SILICIDE PHASE-TRANSFORMATION IN NARROW LINES, Applied physics letters, 66(14), 1995, pp. 1732-1734
Authors:
CABRAL C
CLEVENGER LA
SCHAD RG
Citation: C. Cabral et al., REPEATED COMPRESSIVE STRESS INCREASE WITH 400 DEGREES-C THERMAL CYCLING IN TANTALUM THIN-FILMS DUE TO INCREASES IN THE OXYGEN-CONTENT, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2818-2821
Authors:
ARCOT B
MURARKA SP
CLEVENGER LA
HONG QZ
ZIEGLER W
HARPER JME
Citation: B. Arcot et al., INTERMETALLIC FORMATION IN COPPER MAGNESIUM THIN-FILMS - KINETICS, NUCLEATION AND GROWTH, AND EFFECT OF INTERFACIAL OXYGEN/, Journal of applied physics, 76(9), 1994, pp. 5161-5170
Authors:
CLEVENGER LA
MANN RW
ROY RA
SAENGER KL
CABRAL C
PICCIRILLO J
Citation: La. Clevenger et al., STUDY OF C49-TISI2 AND C54-TISI2 FORMATION ON DOPED POLYCRYSTALLINE SILICON USING IN-SITU RESISTANCE MEASUREMENTS DURING ANNEALING, Journal of applied physics, 76(12), 1994, pp. 7874-7881
Authors:
MANN RW
CLEVENGER LA
Citation: Rw. Mann et La. Clevenger, THE C49 TO C54 PHASE-TRANSFORMATION IN TISI2 THIN-FILMS, Journal of the Electrochemical Society, 141(5), 1994, pp. 1347-1350
Authors:
COLGAN EG
CLEVENGER LA
CABRAL C
Citation: Eg. Colgan et al., ACTIVATION-ENERGY FOR C94 AND C54 TISI2 FORMATION MEASURED DURING RAPID THERMAL ANNEALING, Applied physics letters, 65(16), 1994, pp. 2009-2011
Authors:
HONG QZ
BARMAK K
HONG SQ
CLEVENGER LA
Citation: Qz. Hong et al., CRYSTALLIZATION OF COEVAPORATED AND ION-IRRADIATED AMORPHOUS COSI2, Journal of applied physics, 74(8), 1993, pp. 4958-4962
Authors:
PAUNOVIC M
CLEVENGER LA
GUPTA J
CABRAL C
HARPER JME
Citation: M. Paunovic et al., ELECTRICAL-RESISTANCE AND STRESS OF BILAYER CO(P) CU AND NI(P)/CU THIN-FILMS/, Journal of the Electrochemical Society, 140(9), 1993, pp. 2690-2694
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