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Results: 1-5 |
Results: 5

Authors: LINDSAY T BARCLAY GG CRONIN MF DELLAGUARDIA R CONLEY W ITO H MORI M HAGERTY P SINTA R ZYDOWSKY T THACKERAY JW
Citation: T. Lindsay et al., A NEW POSITIVE DUV PHOTORESIST OPTIMIZED FOR 0.25-MU-M ISOLATED LINES, Microelectronic engineering, 35(1-4), 1997, pp. 109-112

Authors: SACHDEV H KWONG R LINEHAN L CONLEY W MIURA S SMITH R KATNANI A
Citation: H. Sachdev et al., NEW NEGATIVE TONE RESISTS FOR SUBHALF MICRON LITHOGRAPHY, Microelectronic engineering, 23(1-4), 1994, pp. 321-326

Authors: CONLEY W
Citation: W. Conley, MULTISTAGE MONTE-CARLO AND NONLINEAR TEST PROBLEMS, International Journal of Systems Science, 25(1), 1994, pp. 155-171

Authors: CONLEY W EIB N PLAT M SMITH R
Citation: W. Conley et al., CHARACTERIZATION ENHANCEMENTS IN RESIST PHOTOSPEED, Journal of the Electrochemical Society, 141(4), 1994, pp. 1034-1040

Authors: CONLEY W
Citation: W. Conley, SIMULATION APPLIED TO A 300 DEGREE POLYNOMIAL, International Journal of Systems Science, 24(5), 1993, pp. 819-828
Risultati: 1-5 |