Authors:
LINDSAY T
BARCLAY GG
CRONIN MF
DELLAGUARDIA R
CONLEY W
ITO H
MORI M
HAGERTY P
SINTA R
ZYDOWSKY T
THACKERAY JW
Citation: T. Lindsay et al., A NEW POSITIVE DUV PHOTORESIST OPTIMIZED FOR 0.25-MU-M ISOLATED LINES, Microelectronic engineering, 35(1-4), 1997, pp. 109-112