Authors: Nagels, P Tichy, L Mertens, R Callaerts, R

Citation: P. Nagels et al., Low-temperature photodarkening of the AsxSe100-x system prepared by PECVD, MATER LETT, 46(4), 2000, pp. 234-238

Authors: Ticha, H Tichy, L Nagels, P Sleeckx, E Callaerts, R

Citation: H. Ticha et al., Temperature dependence of the optical gap in thin amorphous films of As2S3, As2Se3 and other basic non-crystalline chalcogenides, J PHYS CH S, 61(4), 2000, pp. 545-550

Authors: Nagels, P Callaerts, R Mertens, R

Citation: P. Nagels et al., Plasma-enhanced chemical vapour deposition and structural characterizationof amorphous chalcogenide films, J PHYS IV, 9(P8), 1999, pp. 717-724

Authors: Tichy, L Vidourek, A Nagels, P Callaerts, R Ticha, H

Citation: L. Tichy et al., On the origin of reversible photodarkening in amorphous As2S3 thin films (vol 10, pg 117, 1998), OPT MATER, 13(2), 1999, pp. 277-277

Authors: Tichy, L Ticha, H Nagels, P Callaerts, R Mertens, R Vlcek, M

Citation: L. Tichy et al., Optical properties of amorphous As-Se and Ge-As-Se thin films, MATER LETT, 39(2), 1999, pp. 122-128

Authors: Marquez, E Nagels, P Gonzalez-Leal, JM Bernal-Oliva, AM Sleeckx, E Callaerts, R

Citation: E. Marquez et al., On the optical constants of amorphous GexSe1-x thin films of non-uniform thickness prepared by plasma-enhanced chemical vapour deposition, VACUUM, 52(1-2), 1999, pp. 55-60