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Results: 14
Efficient removal of foxing from a medieval Ptolemaic map using a molecular fluorine laser at 157 nm
Authors:
Cefalas, AC
Sarantopoulou, E
Kollia, Z
Citation: Ac. Cefalas et al., Efficient removal of foxing from a medieval Ptolemaic map using a molecular fluorine laser at 157 nm, APPL PHYS A, 73(5), 2001, pp. 571-578
Authors:
Sarantopoulou, E
Cefalas, AC
Argitis, P
Gogolides, E
Citation: E. Sarantopoulou et al., Photoresist materials for 157-nm photolithography, MAT SCI E C, 15(1-2), 2001, pp. 159-161
Authors:
Sarantopoulou, E
Kollia, Z
Cefalas, AC
Citation: E. Sarantopoulou et al., YF3 : Nd3+, Pr3+, Gd3+ wide band gap crystals as optical materials for 157-nm photolithography, OPT MATER, 18(1), 2001, pp. 23-26
Authors:
Vourdas, A
Cefalas, AC
Sarantopoulou, E
Citation: A. Vourdas et al., Vortex interference in Josephson arrays in the insulating phase, SYNTH METAL, 124(1), 2001, pp. 265-266
Authors:
Sarantopoulou, E
Skordoulis, C
Cefalas, AC
Vourdas, A
Citation: E. Sarantopoulou et al., Modulation of period of quantum beats from optical emissions from the excited electronic states of mercury triatomic clusters, SYNTH METAL, 124(1), 2001, pp. 267-269
Authors:
Sarantopoulou, E
Kollia, Z
Cefalas, AC
Citation: E. Sarantopoulou et al., Intense vacuum ultraviolet emission at 172 nm from LaF3 : Nd3+ crystals, MICROEL ENG, 57-8, 2001, pp. 93-99
Authors:
Cefalas, AC
Vassilopoulos, N
Sarantopoulou, E
Kollia, Z
Skordoulis, C
Citation: Ac. Cefalas et al., Mass spectroscopy and ablation characteristics of nylon 6.6 in the ultraviolet, APPL PHYS A, 70(1), 2000, pp. 21-28
Authors:
Sarantopoulou, E
Kollia, Z
Cefalas, AC
Citation: E. Sarantopoulou et al., Wide band gap fluoride dielectric crystals doped with trivalent rare earthions as optical materials for 157 nm photolithography, MICROEL ENG, 53(1-4), 2000, pp. 105-108
Authors:
Cefalas, AC
Sarantopoulou, E
Gogolides, E
Argitis, P
Citation: Ac. Cefalas et al., Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography, MICROEL ENG, 53(1-4), 2000, pp. 123-126
Authors:
Cefalas, AC
Sarantopoulou, E
Citation: Ac. Cefalas et E. Sarantopoulou, 157nm photodissociation of polyamides, MICROEL ENG, 53(1-4), 2000, pp. 465-468
Authors:
Sarantopoulou, E
Kollia, Z
Cefalas, AC
Citation: E. Sarantopoulou et al., LiCaAlF6 : Nd3+ crystal as optical material for 157 nm photolithography, OPT COMMUN, 177(1-6), 2000, pp. 377-382
Authors:
Cefalas, AC
Sarantopoulou, E
Argitis, P
Gogolides, E
Citation: Ac. Cefalas et al., Mass spectroscopic and degassing characteristics of polymeric materials for 157 nm photolithography, APPL PHYS A, 69, 1999, pp. S929-S933
Authors:
Cefalas, AC
Sarantopoulou, E
Kollia, Z
Citation: Ac. Cefalas et al., Vacuum ultraviolet 4f(9)5d -> 4f(10) interconfigurational transitions of Ho3+ ions in LiLuF4 single crystals, J OPT SOC B, 16(4), 1999, pp. 625-630
Authors:
Sarantopoulou, E
Kollia, Z
Cefalas, AC
Citation: E. Sarantopoulou et al., 4f(9)5d -> 4f(10) spin-allowed and spin-forbidden transitions of Ho3+ ionsin LiYF4 single crystals in the vacuum ultraviolet, OPT COMMUN, 169(1-6), 1999, pp. 263-274
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