Authors:
Laskarakis, A
Logothetidis, S
Charitidis, C
Gioti, M
Panayiotatos, Y
Handrea, M
Kautek, W
Citation: A. Laskarakis et al., A study on the bonding structure and mechanical properties of magnetron sputtered CNx thin films, DIAM RELAT, 10(3-7), 2001, pp. 1179-1184
Citation: C. Charitidis et al., A comparative study of the nanoscratching behavior of amorphous carbon films grown under various deposition conditions, SURF COAT, 125(1-3), 2000, pp. 201-206
Authors:
Patsalas, P
Charitidis, C
Logothetidis, S
Citation: P. Patsalas et al., The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films, SURF COAT, 125(1-3), 2000, pp. 335-340
Authors:
Patsalas, P
Charitidis, C
Logothetidis, S
Citation: P. Patsalas et al., In situ and real-time ellipsometry monitoring of submicron titanium nitride/titanium silicide electronic devices, APPL SURF S, 154, 2000, pp. 256-262
Authors:
Logothetidis, S
Charitidis, C
Patsalas, P
Kehagias, T
Citation: S. Logothetidis et al., A comparative study of composition, structure and elastic properties of boron nitride films deposited by magnetron and ion beam sputtering, DIAM RELAT, 8(2-5), 1999, pp. 410-414
Authors:
Rebholz, C
Leyland, A
Larour, P
Charitidis, C
Logothetidis, S
Matthews, A
Citation: C. Rebholz et al., The effect of boron additions on the tribological behaviour of TiN coatings produced by electron-beam evaporative PVD, SURF COAT, 119, 1999, pp. 648-653
Authors:
Logothetidis, S
Gioti, M
Charitidis, C
Patsalas, P
Arvanitidis, J
Stoemenos, J
Citation: S. Logothetidis et al., Stability, enhancement of elastic properties and structure of multilayeredamorphous carbon films, APPL SURF S, 139, 1999, pp. 244-249
Authors:
Gioti, M
Logothetidis, S
Charitidis, C
Lefakis, H
Citation: M. Gioti et al., Composition, chemical bonding and mechanical properties of magnetron sputtered CNx thin films at different substrate bias, VACUUM, 53(1-2), 1999, pp. 53-56
Authors:
Logothetidis, S
Gioti, M
Charitidis, C
Patsalas, P
Citation: S. Logothetidis et al., A new process for the development of hard and stable sputtered amorphous carbon films, VACUUM, 53(1-2), 1999, pp. 61-65
Citation: S. Logothetidis et C. Charitidis, Elastic properties of hydrogen-free amorphous carbon thin films and their relation with carbon-carbon bonding, THIN SOL FI, 353(1-2), 1999, pp. 208-213
Authors:
Patsalas, P
Charitidis, C
Logothetidis, S
Dimitriadis, CA
Valassiades, O
Citation: P. Patsalas et al., Combined electrical and mechanical properties of titanium nitride thin films as metallization materials, J APPL PHYS, 86(9), 1999, pp. 5296-5298