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Results: 1-8 |
Results: 8

Authors: Jelinek, M Kulisch, W Delplancke-Ogletree, MP Lancok, J Jastrabik, L Chvostova, D Popov, C Bulir, J
Citation: M. Jelinek et al., Mechanical and optical properties of CNx films with high N/C ratio, APPL PHYS A, 73(2), 2001, pp. 167-170

Authors: Hubicka, Z Sicha, M Pajasova, L Soukup, L Jastrabik, L Chvostova, D Wagner, T
Citation: Z. Hubicka et al., CNx coatings deposited by pulsed RF supersonic plasma jet: hardness, nitrogenation and optical properties, SURF COAT, 142, 2001, pp. 681-687

Authors: Kulikovsky, V Bohac, P Franc, F Chvostova, D Deineka, A Vorlicek, V Jastrabik, L
Citation: V. Kulikovsky et al., Degradation and stress evolution in a-C, a-C : H and Ti-C : H films, SURF COAT, 142, 2001, pp. 702-706

Authors: Fendrych, F Pajasova, L Wagner, T Jastrabik, L Chvostova, D Soukup, L Rusnak, K
Citation: F. Fendrych et al., CNx coatings sputtered by DC magnetron: hardness, nitrogenation and optical properties, DIAM RELAT, 8(8-9), 1999, pp. 1711-1714

Authors: Fendrych, F Soukup, L Jastrabik, L Sicha, M Hubicka, Z Chvostova, D Tarasenko, A Studnicka, V Wagner, T
Citation: F. Fendrych et al., Cu3N films prepared by the low-pressure r.f. supersonic plasma jet reactor: Structure and optical properties, DIAM RELAT, 8(8-9), 1999, pp. 1715-1719

Authors: Jelinek, M Kulisch, W Delplancke-Ogletree, MP Vorlicek, V Studnicka, V Chvostova, D Trchova, M Sobota, J
Citation: M. Jelinek et al., Application-relevant characterization of magnetron-sputtered carbon nitride films, DIAM RELAT, 8(10), 1999, pp. 1857-1862

Authors: Soukup, L Sicha, M Fendrych, F Jastrabik, L Hubicka, Z Chvostova, D Sichova, H Valvoda, V Tarasenko, A Studnicka, V Wagner, T Novak, M
Citation: L. Soukup et al., Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system, SURF COAT, 119, 1999, pp. 321-326

Authors: Deineka, AG Tarasenko, AA Jastrabik, L Chvostova, D Bousek, J
Citation: Ag. Deineka et al., An ellipsometric study of W thin films deposited on Si, THIN SOL FI, 339(1-2), 1999, pp. 216-219
Risultati: 1-8 |