Authors:
HUDEK P
RANGELOW IW
KOSTIC I
MUNZEL N
DARAKTCHIEV I
Citation: P. Hudek et al., EVALUATION OF CHEMICALLY AMPLIFIED DEEP UV RESIST FOR MICROMACHINING USING E-BEAM LITHOGRAPHY AND DRY-ETCHING, Microelectronic engineering, 30(1-4), 1996, pp. 309-312