Citation: La. Pinnaduwage et al., ELECTRON-ATTACHMENT TO PHOTOFRAGMENTS AND RYDBERG STATES IN LASER-IRRADIATED CCL2F2, Journal of applied physics, 84(7), 1998, pp. 3442-3450
Citation: Pg. Datskos et al., PHOTOPHYSICAL AND ELECTRON-ATTACHMENT PROPERTIES OF ARF-EXCIMER-LASERIRRADIATED H-2, Physical review. A, 55(6), 1997, pp. 4131-4142
Citation: La. Pinnaduwage et Pg. Datskos, ELECTRON-ATTACHMENT TO EXCITED-STATES OF SILANE - IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES, Journal of applied physics, 81(12), 1997, pp. 7715-7727
Citation: La. Pinnaduwage et Pg. Datskos, NOVEL TECHNIQUE FOR REAL-TIME MONITORING OF ELECTRON-ATTACHMENT TO LASER-EXCITED MOLECULES, The Journal of chemical physics, 104(21), 1996, pp. 8382-8392
Citation: Lg. Christophorou et Pg. Datskos, EFFECT OF TEMPERATURE ON THE FORMATION AND AUTODESTRUCTION OF PARENT ANIONS, International journal of mass spectrometry and ion processes, 150, 1995, pp. 59-77
Citation: Lg. Christophorou et al., PHOTODETACHMENT IN THE GASEOUS, LIQUID, AND SOLID STATES OF MATTER, The Journal of chemical physics, 101(8), 1994, pp. 6728-6742
Citation: Lg. Christophorou et al., TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS - REPLY, The Journal of chemical physics, 100(9), 1994, pp. 6983-6983
Citation: Pg. Datskos et al., TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS (VOL 98, PG 7875, 1993), The Journal of chemical physics, 99(9), 1993, pp. 7279-7279
Citation: Pg. Datskos et al., EFFECT OF TEMPERATURE ON THE ATTACHMENT OF SLOW (LESS-THAN-OR-EQUAL-TO-1 EV) ELECTRONS TO CH3BR (VOL 97, PG 9031, 1992), The Journal of chemical physics, 99(5), 1993, pp. 4238-4238
Citation: Pg. Datskos et al., TEMPERATURE-DEPENDENCE OF ELECTRON-ATTACHMENT AND DETACHMENT IN SF6 AND C-C4F6, The Journal of chemical physics, 99(11), 1993, pp. 8607-8616
Citation: Pg. Datskos et al., TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS, The Journal of chemical physics, 98(10), 1993, pp. 7875-7882