Authors:
ROULET F
TRISTANT P
DESMAISON J
REZAKHANLOU R
FERRATO M
Citation: F. Roulet et al., CORROSION BEHAVIOR OF ALUMINUM NITRIDE IN LIQUID ALUMINUM - INFLUENCEOF THE MICROSTRUCTURE, Journal of the European Ceramic Society, 17(15-16), 1997, pp. 1877-1883
Citation: M. Desmaisonbrut et al., COMPARISON OF THE OXIDATION BEHAVIOR OF 2 DENSE HOT ISOSTATICALLY PRESSED TANTALUM CARBIDE (TAC AND TA2C) MATERIALS, Journal of the European Ceramic Society, 17(11), 1997, pp. 1325-1334
Authors:
JONNARD P
TIXIER C
DESMAISON J
HOMBOURGER C
BONNELLE C
Citation: P. Jonnard et al., STUDY OF THE ADHESION BETWEEN A-CH FILMS AND TA6V SUBSTRATES BY ELECTRON-INDUCED X-RAY-EMISSION SPECTROSCOPY (EXES), Thin solid films, 306(1), 1997, pp. 119-123
Citation: C. Regnier et al., REMOTE MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF INSULATING COATINGS (SIO2) ON METALLIC SUBSTRATES - FILM PROPERTIES, Surface & coatings technology, 80(1-2), 1996, pp. 18-22
Citation: C. Tixier et al., REMOTE MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF AMORPHOUS-CARBON ON SILICON AND TITANIUM-ALLOY SUBSTRATES, Surface & coatings technology, 80(1-2), 1996, pp. 129-133
Citation: C. Tixier et al., REMOTE MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF AMORPHOUS-CARBON - OPTICAL-EMISSION SPECTROSCOPY CHARACTERIZATION OF THE AFTERGLOW AND GROWTH-RATES, Journal de physique. IV, 5(C5), 1995, pp. 593-600
Citation: C. Regnier et al., REMOTE MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SIO2-FILMS - OXYGEN PLASMA DIAGNOSTIC, Journal de physique. IV, 5(C5), 1995, pp. 621-628
Authors:
MOURADOFF L
LACHAUDURAND A
DESMAISON J
LABBE JC
GRISOT O
REZAKHANLOU R
Citation: L. Mouradoff et al., STUDY OF THE INTERACTION BETWEEN LIQUID ALUMINUM AND SILICON-NITRIDE, Journal of the European Ceramic Society, 13(4), 1994, pp. 323-328
Citation: C. Courtois et al., PROTECTION AGAINST OXIDATION OF C SIC COMPOSITES - OXIDATION BEHAVIOROF CVD TIB2 COATED SUBSTRATES/, Journal de physique. IV, 3(C9), 1993, pp. 843-853
Citation: H. Delpuppo et al., A COMPARATIVE-STUDY OF O2 SIH4 AND N2O/SIH4 MIXTURES FOR SIO2 DEPOSITION IN A MICROWAVE AFTERGLOW/, Journal de physique. IV, 3(C3), 1993, pp. 241-246