Authors: PAL R DHAUL A AGARWAL SK PAL D BOSE DN

Citation: R. Pal et al., EFFECTIVE TECHNIQUES FOR REDUCTION OF SILICON IMPURITY IN CHLORIDE VAPOR-PHASE EPITAXIAL-GROWTH OF GAINAS, Materials research bulletin, 33(2), 1998, pp. 261-267

Authors: KOLLURI SV CHANDORKAR AN DHAUL A

Citation: Sv. Kolluri et al., INDIUM DOPING OF SILICON USING AN EVAPORATED INDIUM FILM SOURCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(5), 1993, pp. 2849-2850

Authors: BERTOLOTTI M FERRARI A DECESARE JP CHANKIN AV LUBNIN EN MIKHAILOVA GN SEFEROV AS SPIRIDONOV VB SYCHUGOV VA DHAUL A CHANDER R

Citation: M. Bertolotti et al., LASER AND THERMAL-PROCESSING FOR TILINBO3 WAVE-GUIDE FABRICATION, Applied physics. A, Solids and surfaces, 56(4), 1993, pp. 349-351

Authors: KUMAR R NATH R DUTT MB DHAUL A KHOSLA YP SHARMA BL

Citation: R. Kumar et al., CHARACTERIZATION OF FURNACE-ANNEALED SI-IMPLANTED INPFE, Semiconductor science and technology, 8(8), 1993, pp. 1679-1681