Authors: HACKENBERG JJ DION MJ HEMMENWAY DF PEARCE LG WERNER JW

Citation: Jj. Hackenberg et al., IDENTIFICATION OF PLASMA-INDUCED FAILURE MODES IN THE DEVELOPMENT OF A BIPOLAR-COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR PROCESS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 943-947

Authors: DION MJ

Citation: Mj. Dion, ON THE STATUS OF WAFER-LEVEL METAL INTEGRITY TESTING, Microelectronics and reliability, 33(11-12), 1993, pp. 1807-1827