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Results: 1-10 |
Results: 10
SUBSTRATE BIAS EFFECT OF THE ACTIVATED REACTIVE EVAPORATION PROCESSEDBETA-SIC THIN-FILMS
Authors: CHA YHC KIM PG DOERR HJ BUNSHAH RF
Citation: Yhc. Cha et al., SUBSTRATE BIAS EFFECT OF THE ACTIVATED REACTIVE EVAPORATION PROCESSEDBETA-SIC THIN-FILMS, Surface & coatings technology, 90(1-2), 1997, pp. 35-41
ELECTRON-EMISSION CHARACTERIZATION OF DIAMOND THIN-FILMS GROWN FROM ASOLID CARBON SOURCE
Authors: JOU S DOERR HJ BUNSHAH RF
Citation: S. Jou et al., ELECTRON-EMISSION CHARACTERIZATION OF DIAMOND THIN-FILMS GROWN FROM ASOLID CARBON SOURCE, Thin solid films, 280(1-2), 1996, pp. 256-261
THE RELATIONSHIP BETWEEN THE SPATIALLY-RESOLVED FIELD-EMISSION CHARACTERISTICS AND THE RAMAN-SPECTRA OF A NANOCRYSTALLINE DIAMOND COLD-CATHODE
Authors: TALIN AA PAN LS MCCARTY KF FELTER TE DOERR HJ BUNSHAH RF
Citation: Aa. Talin et al., THE RELATIONSHIP BETWEEN THE SPATIALLY-RESOLVED FIELD-EMISSION CHARACTERISTICS AND THE RAMAN-SPECTRA OF A NANOCRYSTALLINE DIAMOND COLD-CATHODE, Applied physics letters, 69(25), 1996, pp. 3842-3844
ELECTRICAL-RESISTANCE DRIFT OF MOLYBDENUM SILICIDE THIN-FILM TEMPERATURE SENSORS
Authors: HO CH CHA YHC PRAKASH S POTWIN G DOERR HJ DESHPANDEY CV BUNSHAH RF ZELLER M
Citation: Ch. Ho et al., ELECTRICAL-RESISTANCE DRIFT OF MOLYBDENUM SILICIDE THIN-FILM TEMPERATURE SENSORS, Thin solid films, 260(2), 1995, pp. 232-238
DIAMOND COATINGS FROM A SOLID CARBON SOURCE
Authors: JOU S DOERR HJ BUNSHAH RF
Citation: S. Jou et al., DIAMOND COATINGS FROM A SOLID CARBON SOURCE, Thin solid films, 253(1-2), 1994, pp. 95-102
EFFECTS OF ACTIVATED REACTIVE EVAPORATION PROCESS PARAMETERS ON THE MICROHARDNESS OF POLYCRYSTALLINE SILICON-CARBIDE THIN-FILMS
Authors: CHA YHC KIM G DOERR HJ BUNSHAH RF
Citation: Yhc. Cha et al., EFFECTS OF ACTIVATED REACTIVE EVAPORATION PROCESS PARAMETERS ON THE MICROHARDNESS OF POLYCRYSTALLINE SILICON-CARBIDE THIN-FILMS, Thin solid films, 253(1-2), 1994, pp. 212-217
SYNTHESIS OF BETA-SIC THIN-FILMS FOR HIGH-TEMPERATURE SENSORS BY THE ACTIVATED REACTIVE EVAPORATION PROCESS
Authors: CHA YHC JOU S PRAKASH S DOERR HJ BUNSHAH RF
Citation: Yhc. Cha et al., SYNTHESIS OF BETA-SIC THIN-FILMS FOR HIGH-TEMPERATURE SENSORS BY THE ACTIVATED REACTIVE EVAPORATION PROCESS, Materials science & engineering. A, Structural materials: properties, microstructure and processing, 163(2), 1993, pp. 207-210
ELECTRICAL-PROPERTIES OF POLYCRYSTALLINE BETA-SIC THIN-FILMS FOR HIGH-TEMPERATURE SENSORS GROWN BY THE ACTIVATED REACTIVE EVAPORATION PROCESS
Authors: CHA YHC DOERR HJ BUNSHAH RF
Citation: Yhc. Cha et al., ELECTRICAL-PROPERTIES OF POLYCRYSTALLINE BETA-SIC THIN-FILMS FOR HIGH-TEMPERATURE SENSORS GROWN BY THE ACTIVATED REACTIVE EVAPORATION PROCESS, Surface & coatings technology, 62(1-3), 1993, pp. 697-701
LARGE-AREA COVERAGE OF HIGH T(C)YBA2CU3O7-X THIN-FILMS DEPOSITED WITHTHE ACTIVATED REACTIVE EVAPORATION TECHNIQUE
Authors: STOESSEL CH BUNSHAH RF DOERR HJ
Citation: Ch. Stoessel et al., LARGE-AREA COVERAGE OF HIGH T(C)YBA2CU3O7-X THIN-FILMS DEPOSITED WITHTHE ACTIVATED REACTIVE EVAPORATION TECHNIQUE, Surface & coatings technology, 61(1-3), 1993, pp. 310-314
GROWTH OF LARGE-AREA YBA2CU3O7-X FILMS BY ACTIVATED REACTIVE EVAPORATION
Authors: PRAKASH S CHOU K DOERR HJ DESHPANDEY CV BUNSHAH RF
Citation: S. Prakash et al., GROWTH OF LARGE-AREA YBA2CU3O7-X FILMS BY ACTIVATED REACTIVE EVAPORATION, Thin solid films, 227(1), 1993, pp. 95-99
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