Authors:
KIESLICH A
DOLESCHEL H
KIESELING F
REITHMAIER JP
FORCHEL A
Citation: A. Kieslich et al., REDUCED LATERAL STRAGGLING OF IMPLANTATION-INDUCED DEFECTS IN III V HETEROSTRUCTURES BY ION-IMPLANTATION ALONG CHANNELING DIRECTIONS/, Applied physics letters, 68(1), 1996, pp. 102-104
Authors:
KIESLICH A
DOLESCHEL H
REITHMAIER JP
FORCHEL A
STOFFEL NG
Citation: A. Kieslich et al., IMPLANTATION-INDUCED DAMAGE IN III V-HETEROSTRUCTURES/, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 99(1-4), 1995, pp. 594-597
Authors:
KIESLICH A
DOLESCHEL H
FALLER F
FORCHEL A
STOFFEL NG
Citation: A. Kieslich et al., INVESTIGATION OF THE LONGITUDINAL AND LATERAL DISTRIBUTION OF IMPLANTATION-INDUCED DAMAGE IN GAAS INGAAS HETEROSTRUCTURES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2544-2547