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Results: 1-10 |
Results: 10
A COMPARATIVE-STUDY OF GE NANOCRYSTALS IN SIXGEYOZ ALLOYS AND SIOX GEOY MULTILAYERS/
Authors: ZACHARIAS M WEIGAND R DIETRICH B STOLZE F BLASING J VEIT P DRUSEDAU T CHRISTEN J
Citation: M. Zacharias et al., A COMPARATIVE-STUDY OF GE NANOCRYSTALS IN SIXGEYOZ ALLOYS AND SIOX GEOY MULTILAYERS/, Journal of applied physics, 81(5), 1997, pp. 2384-2390
THE INFLUENCE OF ARGON PRESSURE ON THE STRUCTURE OF SPUTTERED MOLYBDENUM - FROM POROUS AMORPHOUS TO A NEW-TYPE OF HIGHLY TEXTURED FILM
Authors: KLABUNDE F LOHMANN M BLASING J DRUSEDAU T
Citation: F. Klabunde et al., THE INFLUENCE OF ARGON PRESSURE ON THE STRUCTURE OF SPUTTERED MOLYBDENUM - FROM POROUS AMORPHOUS TO A NEW-TYPE OF HIGHLY TEXTURED FILM, Journal of applied physics, 80(11), 1996, pp. 6266-6273
THE EFFECTS OF SULFUR INCORPORATION ON THE OPTOELECTRONIC PROPERTIES OF HYDROGENATED AMORPHOUS-GERMANIUM
Authors: DRUSEDAU T PANG D CHEN JH WICKBOLDT P
Citation: T. Drusedau et al., THE EFFECTS OF SULFUR INCORPORATION ON THE OPTOELECTRONIC PROPERTIES OF HYDROGENATED AMORPHOUS-GERMANIUM, Philosophical magazine letters, 71(3), 1995, pp. 185-192
THE PREPARATION OF AMORPHOUS SIXGEYOZ ALLOY-FILMS BY SPUTTERING - PREPARATION CONDITIONS, CHEMICAL-COMPOSITION, AND VIBRATIONAL PROPERTIES
Authors: ZACHARIAS M STOLZE F DRUSEDAU T BOCK W
Citation: M. Zacharias et al., THE PREPARATION OF AMORPHOUS SIXGEYOZ ALLOY-FILMS BY SPUTTERING - PREPARATION CONDITIONS, CHEMICAL-COMPOSITION, AND VIBRATIONAL PROPERTIES, Physica status solidi. b, Basic research, 189(2), 1995, pp. 409-416
PHYSICAL-PROPERTIES OF A-SIO(X) - H-ALLOYS PREPARED BY DC MAGNETRON SPUTTERING WITH WATER-VAPOR AS OXYGEN SOURCE
Authors: ZACHARIAS M DRUSEDAU T PANCKOW A FREISTEDT H GARKE B
Citation: M. Zacharias et al., PHYSICAL-PROPERTIES OF A-SIO(X) - H-ALLOYS PREPARED BY DC MAGNETRON SPUTTERING WITH WATER-VAPOR AS OXYGEN SOURCE, Journal of non-crystalline solids, 169(1-2), 1994, pp. 29-36
OPTIMIZATION OF PROCESS PARAMETERS FOR THE DEPOSITION OF IMPROVED A-GEH BY DC MAGNETRON SPUTTERING
Authors: DRUSEDAU T SCHRODER B
Citation: T. Drusedau et B. Schroder, OPTIMIZATION OF PROCESS PARAMETERS FOR THE DEPOSITION OF IMPROVED A-GEH BY DC MAGNETRON SPUTTERING, Journal of applied physics, 75(6), 1994, pp. 2864-2875
ACTIVATED TRANSPORT IN IMPROVED HYDROGENATED AMORPHOUS-GERMANIUM (A-GE-H) - THE INFLUENCE OF COOLING RATE, CONTACTS, ELECTRIC-FIELD AND A-SI-H BARRIERS
Authors: DRUSEDAU T PANG D WICKBOLDT P
Citation: T. Drusedau et al., ACTIVATED TRANSPORT IN IMPROVED HYDROGENATED AMORPHOUS-GERMANIUM (A-GE-H) - THE INFLUENCE OF COOLING RATE, CONTACTS, ELECTRIC-FIELD AND A-SI-H BARRIERS, Journal of non-crystalline solids, 166, 1993, pp. 11-14
KEY PARAMETERS FOR FURTHER REDUCTION OF GAP STATES IN A-GE-H AND ITS IMPROVED STABILITY UNDER KEV-ELECTRON IRRADIATION
Authors: DRUSEDAU T MULLER B SCHOLZ A SCHRODER B
Citation: T. Drusedau et al., KEY PARAMETERS FOR FURTHER REDUCTION OF GAP STATES IN A-GE-H AND ITS IMPROVED STABILITY UNDER KEV-ELECTRON IRRADIATION, Journal of non-crystalline solids, 166, 1993, pp. 75-78
THE INFLUENCE OF HYDROGEN AND ARGON PRESSURE ON COMPOSITION AND OPTOELECTRONIC PROPERTIES OF SPUTTERED A-SI1-XGEXH(X-APPROXIMATE-TO-0.4)
Authors: DRUSEDAU T PANCKOW A HERMS W SOBOTTA H RIEDE V BOTTCHER R WITZMANN A
Citation: T. Drusedau et al., THE INFLUENCE OF HYDROGEN AND ARGON PRESSURE ON COMPOSITION AND OPTOELECTRONIC PROPERTIES OF SPUTTERED A-SI1-XGEXH(X-APPROXIMATE-TO-0.4), Journal of non-crystalline solids, 155(3), 1993, pp. 195-208
INFLUENCE OF OXYGEN INCORPORATION ON THE PROPERTIES OF MAGNETRON SPUTTERED HYDROGENATED AMORPHOUS-GERMANIUM FILMS
Authors: SCHRODER B ANNEN A DRUSEDAU T FREISTEDT H DEAK P OECHSNER H
Citation: B. Schroder et al., INFLUENCE OF OXYGEN INCORPORATION ON THE PROPERTIES OF MAGNETRON SPUTTERED HYDROGENATED AMORPHOUS-GERMANIUM FILMS, Applied physics letters, 62(16), 1993, pp. 1961-1963
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