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Results: 1-19 |
Results: 19
ON THE NATURE OF MICROWAVE DEPOSITED HARD SILICON-CARBON FILMS
Authors: SCORDO S DUCARROIR M BECHE E BERJOAN R
Citation: S. Scordo et al., ON THE NATURE OF MICROWAVE DEPOSITED HARD SILICON-CARBON FILMS, Journal of materials research, 13(11), 1998, pp. 3315-3325
NITRIDING PRETREATMENTS COMPATIBLE WITH MOCVD AND PLASMA CVD PROCESSES - INFLUENCE ON THE ADHESION OF CERAMIC COATINGS ON STEEL
Authors: ABISSET S MAURY F DUCARROIR M NADAL M ANDRIEUX M POIRIER L TEYSSANDIER F
Citation: S. Abisset et al., NITRIDING PRETREATMENTS COMPATIBLE WITH MOCVD AND PLASMA CVD PROCESSES - INFLUENCE ON THE ADHESION OF CERAMIC COATINGS ON STEEL, Annales de chimie, 23(5-6), 1998, pp. 707-720
OPTICAL-EMISSION SPECTROSCOPY OF RF AND MICROWAVE PLASMAS USED FOR CHEMICAL-VAPOR-DEPOSITION IN THE SI-C-H-AR SYSTEM
Authors: ANDRIEUX M BADIE JM DUCARROIR M THOMAS L
Citation: M. Andrieux et al., OPTICAL-EMISSION SPECTROSCOPY OF RF AND MICROWAVE PLASMAS USED FOR CHEMICAL-VAPOR-DEPOSITION IN THE SI-C-H-AR SYSTEM, Annales de chimie, 23(5-6), 1998, pp. 743-752
MECHANICAL-PROPERTIES OF THIN-FILMS - PROBLEMS AND TESTING TECHNIQUES
Authors: FELDER E ANGELELIS C DUCARROIR M IGNAT M MAZOT P
Citation: E. Felder et al., MECHANICAL-PROPERTIES OF THIN-FILMS - PROBLEMS AND TESTING TECHNIQUES, Annales de chimie, 23(5-6), 1998, pp. 791-819
DRY FRICTION BEHAVIOR OF SICX(H) (1,5-LESS-THAN-X-LESS-THAN-3) COATINGS OBTAINED BY MICROWAVE PACVD
Authors: BOHER C DUCARROIR M GREGOIRE T SCORDO S
Citation: C. Boher et al., DRY FRICTION BEHAVIOR OF SICX(H) (1,5-LESS-THAN-X-LESS-THAN-3) COATINGS OBTAINED BY MICROWAVE PACVD, Annales de chimie, 23(5-6), 1998, pp. 879-890
MECHANICAL TESTING BY BENDING, NANO-INDENTATION AND MACRO-INDENTATIONOF MICROWAVE PACVD SIC COATINGS ON STEEL
Authors: ANGELELIS C DUCARROIR M FELDER E IGNAT M SCORDO S
Citation: C. Angelelis et al., MECHANICAL TESTING BY BENDING, NANO-INDENTATION AND MACRO-INDENTATIONOF MICROWAVE PACVD SIC COATINGS ON STEEL, Annales de chimie, 23(5-6), 1998, pp. 891-898
BEHAVIOR OF RADIO-FREQUENCY PACVD BILAYERS (SIC TIN) ON STEEL/
Authors: ANDRIEUX M DUCARROIR M BEAUPREZ E
Citation: M. Andrieux et al., BEHAVIOR OF RADIO-FREQUENCY PACVD BILAYERS (SIC TIN) ON STEEL/, Thin solid films, 324(1-2), 1998, pp. 141-150
GAS AND PLASMA NITRIDING PRETREATMENTS OF STEEL SUBSTRATES BEFORE CVDGROWTH OF HARD REFRACTORY COATINGS
Authors: ABISSET S MAURY F FEURER R DUCARROIR M NADAL M ANDRIEUX M
Citation: S. Abisset et al., GAS AND PLASMA NITRIDING PRETREATMENTS OF STEEL SUBSTRATES BEFORE CVDGROWTH OF HARD REFRACTORY COATINGS, Thin solid films, 315(1-2), 1998, pp. 179-185
THE EVOLUTION OF THE TRANSLATIONAL ENERGY OF HYDROGEN-ATOMS IN A 2 MHZ INDUCTIVELY-COUPLED PLASMA DEPOSITION REACTOR
Authors: ANDRIEUX M BADIE JM DUCARROIR M BISCH C
Citation: M. Andrieux et al., THE EVOLUTION OF THE TRANSLATIONAL ENERGY OF HYDROGEN-ATOMS IN A 2 MHZ INDUCTIVELY-COUPLED PLASMA DEPOSITION REACTOR, Journal of physics. D, Applied physics, 31(12), 1998, pp. 1457-1464
MICROWAVE PLASMA CVD IN THE SYSTEM SI-C-H-AR - EFFECT OF PROCESS PARAMETERS
Authors: SCORDO S DUCARROIR M BERJOAN R JAUBERTEAU JL
Citation: S. Scordo et al., MICROWAVE PLASMA CVD IN THE SYSTEM SI-C-H-AR - EFFECT OF PROCESS PARAMETERS, CHEMICAL VAPOR DEPOSITION, 3(3), 1997, pp. 119-128
CERAMIC THIN-FILM THICKNESS DETERMINATION BY NANO-INDENTATION
Authors: MARIE S NADAL M DUCARROIR M FELDER E
Citation: S. Marie et al., CERAMIC THIN-FILM THICKNESS DETERMINATION BY NANO-INDENTATION, Journal of materials science letters, 16(9), 1997, pp. 722-725
OPTICAL-EMISSION ANALYSIS OF A SI(CH3)(4)-ARGON RADIO-FREQUENCY PLASMA FOR SIC FILMS DEPOSITION
Authors: ANDRIEUX M BADIE JM BISCH C DUCARROIR M TEYSSANDIER F
Citation: M. Andrieux et al., OPTICAL-EMISSION ANALYSIS OF A SI(CH3)(4)-ARGON RADIO-FREQUENCY PLASMA FOR SIC FILMS DEPOSITION, Journal de physique. IV, 5(C5), 1995, pp. 607-614
SYSTEM SI-AL-MG-O - THERMODYNAMIC ASPECTS OF ITS INFLUENCE ON THE OXIDATION RESISTANCE OF SILICON-CARBIDE AT HIGH-TEMPERATURE
Authors: DERRE A DUCARROIR M ALLIBERT M
Citation: A. Derre et al., SYSTEM SI-AL-MG-O - THERMODYNAMIC ASPECTS OF ITS INFLUENCE ON THE OXIDATION RESISTANCE OF SILICON-CARBIDE AT HIGH-TEMPERATURE, Journal of the European Ceramic Society, 14(1), 1994, pp. 53-59
VANADOCENE USED AS A PRECURSOR FOR THE CHEMICAL-VAPOR-DEPOSITION OF VANADIUM CARBIDE AT ATMOSPHERIC-PRESSURE
Authors: POIRIER L RICHARD O DUCARROIR M NADAL M TEYSSANDIER F LAURENT F CYRATHIS O CHOUKROUN R VALADE L CASSOUX P
Citation: L. Poirier et al., VANADOCENE USED AS A PRECURSOR FOR THE CHEMICAL-VAPOR-DEPOSITION OF VANADIUM CARBIDE AT ATMOSPHERIC-PRESSURE, Thin solid films, 249(1), 1994, pp. 62-69
REMARKS FOR THE IMPROVEMENT OF THE RESIST ANCE AGAINST OXIDATION OF CARBON-BEARING MATERIALS
Authors: DERRE A DUCARROIR M TEYSSANDIER F
Citation: A. Derre et al., REMARKS FOR THE IMPROVEMENT OF THE RESIST ANCE AGAINST OXIDATION OF CARBON-BEARING MATERIALS, Revue Internationale des Hautes Temperatures et des Refractaires, 29(1), 1994, pp. 11-35
SI-C FILMS ON ALLOYS - CHARACTERIZATION OF AGING BEHAVIOR IN AIR
Authors: AGULLO JM DUCARROIR M CLEMENDOT F LINA A
Citation: Jm. Agullo et al., SI-C FILMS ON ALLOYS - CHARACTERIZATION OF AGING BEHAVIOR IN AIR, Journal de physique. IV, 3(C3), 1993, pp. 163-170
SICN COATINGS PREPARED BY PACVD FROM TMS-NH3-AR SYSTEM ON STEEL
Authors: DUCARROIR M ZHANG W BERJOAN R
Citation: M. Ducarroir et al., SICN COATINGS PREPARED BY PACVD FROM TMS-NH3-AR SYSTEM ON STEEL, Journal de physique. IV, 3(C3), 1993, pp. 247-254
AUGER-ELECTRON SPECTROSCOPY OF COMPOUNDS IN THE SI-TI-C SYSTEM - CHARACTERIZATION OF SI-TI-C MULTIPHASED MATERIALS OBTAINED BY CVD
Authors: MALINE M DUCARROIR M TEYSSANDIER F HILLEL R BERJOAN R VANLOO FJJ WAKELKAMP W
Citation: M. Maline et al., AUGER-ELECTRON SPECTROSCOPY OF COMPOUNDS IN THE SI-TI-C SYSTEM - CHARACTERIZATION OF SI-TI-C MULTIPHASED MATERIALS OBTAINED BY CVD, Surface science, 286(1-2), 1993, pp. 82-91
MICROCOMPOSITE AND NANOCOMPOSITE STRUCTURES FROM CHEMICAL-VAPOR-DEPOSITION IN THE SILICON TITANIUM CARBON SYSTEM
Authors: TOUANEN M TEYSSANDIER F DUCARROIR M MALINE M HILLEL R DEREP JL
Citation: M. Touanen et al., MICROCOMPOSITE AND NANOCOMPOSITE STRUCTURES FROM CHEMICAL-VAPOR-DEPOSITION IN THE SILICON TITANIUM CARBON SYSTEM, Journal of the American Ceramic Society, 76(6), 1993, pp. 1473-1481
Risultati: 1-19 |