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SMEETS J
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EERSELS L
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Authors:
DEKEMPENEER EHA
SMEETS J
MENEVE J
EERSELS L
JACOBS R
Citation: Eha. Dekempeneer et al., PLASMA PROCESSES IN METHANE DISCHARGES DURING RF PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF A-CH THIN-FILMS, Thin solid films, 241(1-2), 1994, pp. 269-273
Authors:
SMEETS J
MENEVE J
JACOBS R
EERSELS L
DEKEMPENEER E
Citation: J. Smeets et al., PHYSICAL AND TRIBOLOGICAL PROPERTIES OF A-SI1-XCX-H COATINGS PREPAREDBY RF PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION, Journal de physique. IV, 3(C3), 1993, pp. 503-510
Authors:
MENEVE J
JACOBS R
EERSELS L
SMEETS J
DEKEMPENEER E
Citation: J. Meneve et al., FRICTION AND WEAR BEHAVIOR OF AMORPHOUS HYDROGENATED SI1-XCX FILMS, Surface & coatings technology, 62(1-3), 1993, pp. 577-582