Citation: Ga. Emmert, MODEL FOR EXPANDING SHEATHS AND SURFACE CHARGING AT DIELECTRIC SURFACES DURING PLASMA SOURCE ION-IMPLANTATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 880-883
Citation: Mp. Hong et Ga. Emmert, 2-DIMENSIONAL FLUID MODELING OF TIME-DEPENDENT PLASMA SHEATH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 889-896
Authors:
KISSICK MW
HONG MP
SHAMIM MM
CALLEN JD
CONRAD JR
EMMERT GA
Citation: Mw. Kissick et al., DEPENDENCE OF ION-MATRIX DOSE ON DENSITY FOR PLANAR, CYLINDRICAL, ANDSPHERICAL ELECTRODES, Journal of applied physics, 76(11), 1994, pp. 7616-7618
Citation: Rr. Speth et al., INFLUENCE OF THE HIGH-VOLTAGE PULSE-SHAPE ON THE PLASMA SOURCE ION-IMPLANTATION PROCESS, Applied physics letters, 65(18), 1994, pp. 2272-2274