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Results:
1-7
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Results: 7
Authors:
EN W
LINDER BP
CHEUNG NW
Citation: W. En et al., MODELING OF OXIDE CHARGING EFFECTS IN PLASMA PROCESSING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 552-559
Authors:
EN W
LINDER BP
CHEUNG NW
Citation: W. En et al., PLASMA IMMERSION ION-IMPLANTATION REACTOR DESIGN CONSIDERATIONS FOR OXIDE CHARGING, Surface & coatings technology, 85(1-2), 1996, pp. 64-69
Authors:
EN W
CHEUNG NW
Citation: W. En et Nw. Cheung, A NEW METHOD FOR DETERMINING THE SECONDARY-ELECTRON YIELD DEPENDENCE ON ION ENERGY FOR PLASMA EXPOSED SURFACES, IEEE transactions on plasma science, 24(3), 1996, pp. 1184-1187
Authors:
EN W
CHEUNG NW
Citation: W. En et Nw. Cheung, MODELING OF CHARGING EFFECTS IN PLASMA IMMERSION ION-IMPLANTATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 96(1-2), 1995, pp. 435-439
Authors:
EN W
CHEUNG NW
Citation: W. En et Nw. Cheung, ANALYTICAL MODELING OF PLASMA IMMERSION ION-IMPLANTATION TARGET CURRENT USING THE SPICE CIRCUIT SIMULATOR, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 833-837
Authors:
JONES EC
EN W
OGAWA S
FRASER DB
CHEUNG NW
Citation: Ec. Jones et al., ANOMALOUS BEHAVIOR OF SHALLOW BF3 PLASMA IMMERSION ION-IMPLANTATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 956-961
Authors:
TIEMEI C
QUAN Y
EN W
Citation: C. Tiemei et al., ANTIQUITY OF HOMO-SAPIENS IN CHINA, Nature, 368(6466), 1994, pp. 55-56
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1-7
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