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Results: 2

Authors: Current, MI Liu, W Roth, IS Lamm, AJ En, WG Malik, IJ Feng, L Bryan, MA Qin, S Henley, FJ Chan, C Cheung, NW
Citation: Mi. Current et al., A plasma immersion implantation system for materials modification, SURF COAT, 136(1-3), 2001, pp. 138-141

Authors: Linder, BP En, WG Cheung, NW
Citation: Bp. Linder et al., The effect of subsurface doping on gate oxide charging damage, IEEE PLAS S, 26(6), 1998, pp. 1628-1634
Risultati: 1-2 |