Authors: Dhaliwal, RS Enichen, WA Golladay, SD Gordon, MS Kendall, RA Lieberman, JE Pfeiffer, HC Pinckney, DJ Robinson, CF Rockrohr, JD Stickel, W Tressler, EV

Citation: Rs. Dhaliwal et al., Prevail - Electron projection technology approach for next-generation lithography, IBM J RES, 45(5), 2001, pp. 615-638

Authors: Gordon, MS Enichen, WA Golladay, SD Pfeiffer, HC Robinson, CF Stickel, W

Citation: Ms. Gordon et al., PREVAIL: Dynamic correction of aberrations, J VAC SCI B, 18(6), 2000, pp. 3079-3083

Authors: Sturans, MA Hartley, JG Pfeiffer, HC Dhaliwal, RS Groves, TR Pavick, JW Quickle, RJ Clement, CS Dick, GJ Enichen, WA Gordon, MS Kendall, RA Kostek, CA Pinckney, DJ Robinson, CF Rockrohr, JD Safran, JM Senesi, JJ Tressler, EV

Citation: Ma. Sturans et al., EL5: One tool for advanced x-ray and chrome on glass mask making, J VAC SCI B, 16(6), 1998, pp. 3164-3167