Authors: FAHEY KP

Citation: Kp. Fahey, METHODS FOR MEASUREMENT OF DEVELOPMENT PARAMETERS IN THE MANUFACTURING LINE FOR USE IN PHOTOLITHOGRAPHY MODELING, IEEE transactions on semiconductor manufacturing, 9(2), 1996, pp. 182-190

Authors: FAHEY KP CLEMENS BM WILLS LA

Citation: Kp. Fahey et al., NONORTHOGONAL TWINNING IN THIN-FILM OXIDE PEROVSKITES, Applied physics letters, 67(17), 1995, pp. 2480-2482

Authors: NUTTALL WJ FAHEY KP YOUNG MJ KEIMER B BIRGENEAU RJ SUEMATSU H

Citation: Wj. Nuttall et al., A SYNCHROTRON X-RAY-DIFFRACTION STUDY OF THE STRUCTURAL PHASE-BEHAVIOR OF MULTILAYER XENON ON SINGLE-CRYSTAL GRAPHITE, Journal of physics. Condensed matter, 5(44), 1993, pp. 8159-8176