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Results:
1-7
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Results: 7
Authors:
MALIK SM
FETHERSTON RP
CONRAD JR
Citation: Sm. Malik et al., DEVELOPMENT OF AN ENERGETIC ION-ASSISTED MIXING AND DEPOSITION PROCESS FOR TINX AND DIAMOND-LIKE CARBON-FILMS, USING A COAXIAL GEOMETRY IN PLASMA SOURCE ION-IMPLANTATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(6), 1997, pp. 2875-2879
Authors:
SHIVPURI R
CHU YL
VENKATESAN K
CONRAD JR
SRIDHARAN K
SHAMIM M
FETHERSTON RP
Citation: R. Shivpuri et al., AN EVALUATION OF METALLIC COATINGS FOR EROSIVE WEAR-RESISTANCE IN DIE-CASTING APPLICATIONS, Wear, 192(1-2), 1996, pp. 49-55
Authors:
GOECKNER MJ
FETHERSTON RP
HITCHON WNG
HORSWILL NC
KEITER ER
SHAMIM MM
BREUN RA
CONRAD JR
SHERIDAN TE
Citation: Mj. Goeckner et al., DYNAMICS OF COLLISIONAL PULSED PLANAR SHEATHS, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 51(4), 1995, pp. 3760-3763
Authors:
MALIK SM
MULLER DE
SRIDHARAN K
FETHERSTON RP
TRAN N
CONRAD JR
Citation: Sm. Malik et al., DISTRIBUTION OF INCIDENT IONS AND RETAINED DOSE ANALYSIS FOR A WEDGE-SHAPED TARGET IN PLASMA SOURCE ION-IMPLANTATION, Journal of applied physics, 77(3), 1995, pp. 1015-1019
Authors:
MALIK SM
SRIDHARAN K
FETHERSTON RP
CHEN A
CONRAD JR
Citation: Sm. Malik et al., OVERVIEW OF PLASMA SOURCE ION-IMPLANTATION RESEARCH AT UNIVERSITY-OF-WISCONSIN-MADISON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 843-849
Authors:
WALTER KC
FETHERSTON RP
SRIDHARAN K
CHEN A
SHAMIM MM
CONRAD JR
Citation: Kc. Walter et al., SPUTTER-DEPOSITION OF TANTALUM-NITRIDE FILMS ON COPPER USING AN RF-PLASMA, Materials research bulletin, 29(8), 1994, pp. 827-832
Authors:
TANG BY
FETHERSTON RP
SHAMIM M
BREUN RA
CHEN A
CONRAD JR
Citation: By. Tang et al., MEASUREMENT OF ION SPECIES RATIO IN THE PLASMA SOURCE ION-IMPLANTATION PROCESS, Journal of applied physics, 73(9), 1993, pp. 4176-4180
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