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Results:
1-10
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Results: 10
Authors:
FARROW RC
POSTEK MT
KEERY WJ
JONES SN
LOWNEY JR
BLAKEY M
FETTER LA
GRIFFITH JE
LIDDLE JA
HOPKINS LC
HUGGINS HA
PEABODY M
NOVEMBRE A
Citation: Rc. Farrow et al., APPLICATION OF TRANSMISSION ELECTRON DETECTION TO SCALPEL MASK METROLOGY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2167-2172
Authors:
LIDDLE JA
BLAKEY MI
SAUNDERS T
FARROW RC
FETTER LA
KNUREK CS
KASICA R
NOVEMBRE AE
PEABODY ML
TENNANT DM
WINDT DL
POSTEK M
Citation: Ja. Liddle et al., METROLOGY OF SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2197-2203
Authors:
WATSON GP
FETTER LA
LIDDLE JA
Citation: Gp. Watson et al., DOSE MODIFICATION PROXIMITY EFFECT CORRECTION SCHEME WITH INHERENT FORWARD SCATTERING CORRECTIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2309-2312
Authors:
NGUYEN KB
CARDINALE GF
TICHENOR DA
KUBIAK GD
BERGER K
RAYCHAUDHURI AK
PERRAS Y
HANEY SJ
NISSEN R
KRENZ K
STULEN RH
FUJIOKA H
HU C
BOKOR J
TENNANT DM
FETTER LA
Citation: Kb. Nguyen et al., FABRICATION OF METAL-OXIDE-SEMICONDUCTOR DEVICES WITH EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4188-4192
Authors:
LIDDLE JA
BERGER SD
BIDDICK CJ
BLAKEY MI
BOLAN KJ
BOWLER SW
BRADY K
CAMARDA RM
CONNELLY WF
CRORKEN A
CUSTY J
FARROW RC
FELKER JA
FETTER LA
FREEMAN B
HARRIOTT LR
HOPKINS L
HUGGINS HA
KNUREK CS
KRAUS JS
MIXON DA
MKRTCHYAN MM
NOVEMBRE AE
PEABODY ML
SIMPSON WM
TARASCON RG
WADE HH
WASKIEWICZ WK
WATSON GP
WILLIAMS JK
WINDT DL
Citation: Ja. Liddle et al., THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM, JPN J A P 1, 34(12B), 1995, pp. 6663-6671
Authors:
WATSON GP
BERGER SD
LIDDLE JA
FETTER LA
FARROW RC
TARASCON RG
MKRTCHYAN M
NOVEMBRE AE
BLAKEY MI
BOLAN KJ
POLI L
Citation: Gp. Watson et al., PRECISE MEASUREMENT OF THE EFFECTIVE BACKSCATTER COEFFICIENT FOR 100-KEV ELECTRON-BEAM LITHOGRAPHY ON SI, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2535-2538
Authors:
NGUYEN KB
RAYCHAUDHURI AK
STULEN RH
KRENZ K
FETTER LA
TENNANT DM
WINDT DL
Citation: Kb. Nguyen et al., PRINTABILITY OF SUBSTRATE AND ABSORBER DEFECTS ON EXTREME-ULTRAVIOLETLITHOGRAPHIC MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3082-3088
Authors:
TARASCON RG
BOLAN K
BLAKEY M
CAMARDA RM
FARROW RC
FETTER LA
HUGGINS HA
KRAUS JS
LIDDLE JA
MIXON DA
NOVEMBRE AE
WATSON GP
BERGER SD
Citation: Rg. Tarascon et al., LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3444-3448
Authors:
KUBIAK GD
TICHENOR DA
RAYCHAUDHURI AK
MALINOWSKI ME
STULEN RH
HANEY SJ
BERGER KW
NISSEN RP
WILKERSON GA
PAUL PH
BJORKHOLM JE
FETTER LA
FREEMAN RR
HIMEL MD
MACDOWELL AA
TENNANT DM
WOOD OR
WASKIEWICZ WK
WHITE DL
WINDT DL
JEWELL TE
Citation: Gd. Kubiak et al., CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3820-3825
Authors:
TENNANT DM
FETTER LA
HARRIOTT LR
MACDOWELL AA
MULGREW PP
PASTALAN JZ
WASKIEWICZ WK
WINDT DL
WOOD OR
Citation: Dm. Tennant et al., MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM, Applied optics, 32(34), 1993, pp. 7007-7011
Risultati:
1-10
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