Authors: ROTHSCHILD M FORTE AR KUNZ RR PALMATEER SC SEDLACEK JHC

Citation: M. Rothschild et al., LITHOGRAPHY AT A WAVELENGTH OF 193 NM, IBM journal of research and development, 41(1-2), 1997, pp. 49-55

Authors: ROTHSCHILD M BURNS JA CANN SG FORTE AR KEAST CL KUNZ RR PALMATEER SC SEDLACEK JHC UTTARO R GRENVILLE A CORLISS D

Citation: M. Rothschild et al., HOW PRACTICAL IS 193 NM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4157-4161

Authors: PALMATEER SC FORTE AR KUNZ RR HORN MW

Citation: Sc. Palmateer et al., DRY DEVELOPMENT OF SUB-0.25 MU-M FEATURES PATTERNED WITH 193 NM SILYLATION RESIST, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1132-1136

Authors: ROTHSCHILD M FORTE AR HORN MW KUNZ RR PALMATEER SC SEDLACEK JHC

Citation: M. Rothschild et al., 193-NM LITHOGRAPHY, IEEE journal of selected topics in quantum electronics, 1(3), 1995, pp. 916-923