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Results: 1-25 | 26-46 |
Results: 26-46/46
PLASMA PLANARIZATION FOR SENSOR APPLICATIONS
Authors: LI YX FRENCH PJ WOLFFENBUTTEL RF
Citation: Yx. Li et al., PLASMA PLANARIZATION FOR SENSOR APPLICATIONS, Journal of microelectromechanical systems, 4(3), 1995, pp. 132-138
LOW-TEMPERATURE BPSG REFLOW COMPATIBLE WITH SURFACE MICROMACHINING
Authors: FRENCH PJ WOLFFENBUTTEL RF
Citation: Pj. French et Rf. Wolffenbuttel, LOW-TEMPERATURE BPSG REFLOW COMPATIBLE WITH SURFACE MICROMACHINING, Journal of micromechanics and microengineering, 5(2), 1995, pp. 125-127
SILICON SENSORS
Authors: MIDDELHOEK S BELLEKOM AA DAUDERSTADT U FRENCH PJ THOUT SRI KINDT W RIEDIJK F VELLEKOOP MJ
Citation: S. Middelhoek et al., SILICON SENSORS, Measurement science & technology, 6(12), 1995, pp. 1641-1658
LOW-STRESS NITRIDE AS SURFACE ISOLATION IN BIPOLAR-TRANSISTORS
Authors: NANVER LK FRENCH PJ GOUDENA EJG VANZEIJL HW
Citation: Lk. Nanver et al., LOW-STRESS NITRIDE AS SURFACE ISOLATION IN BIPOLAR-TRANSISTORS, Materials science and technology, 11(1), 1995, pp. 36-40
INOSITOL 1,2,3-TRISPHOSPHATE AND INOSITOL 1,2-BISPHOSPHATE AND OR 2,3-BISPHOSPHATE ARE NORMAL CONSTITUENTS OF MAMMALIAN-CELLS/
Authors: BARKER CJ FRENCH PJ MOORE AJ NILSSON T BERGGREN PO BUNCE CM KIRK CJ MICHELL RH
Citation: Cj. Barker et al., INOSITOL 1,2,3-TRISPHOSPHATE AND INOSITOL 1,2-BISPHOSPHATE AND OR 2,3-BISPHOSPHATE ARE NORMAL CONSTITUENTS OF MAMMALIAN-CELLS/, Biochemical journal, 306, 1995, pp. 557-564
A MOUSE MODEL FOR THE CYSTIC-FIBROSIS DELTA-F508 MUTATION
Authors: VANDOORNINCK JH FRENCH PJ VERBEEK E PETERS RHPC MORREAU H BIJMAN J SCHOLTE BJ
Citation: Jh. Vandoorninck et al., A MOUSE MODEL FOR THE CYSTIC-FIBROSIS DELTA-F508 MUTATION, EMBO journal, 14(18), 1995, pp. 4403-4411
ISOTYPE-SPECIFIC ACTIVATION OF CYSTIC-FIBROSIS TRANSMEMBRANE CONDUCTANCE REGULATOR-CHLORIDE CHANNELS BY CGMP-DEPENDENT PROTEIN-KINASE-II
Authors: FRENCH PJ BIJMAN J EDIXHOVEN M VAANDRAGER AB SCHOLTE BJ LOHMANN SM NAIRN AC DEJONGE HR
Citation: Pj. French et al., ISOTYPE-SPECIFIC ACTIVATION OF CYSTIC-FIBROSIS TRANSMEMBRANE CONDUCTANCE REGULATOR-CHLORIDE CHANNELS BY CGMP-DEPENDENT PROTEIN-KINASE-II, The Journal of biological chemistry, 270(44), 1995, pp. 26626-26631
EFFECTS OF PLASMA-ETCHING CHEMISTRY AND POST-PROCESSING ON THE MECHANICAL ADHESION AND ELECTRICAL CONTACT OF DOUBLE POLYSILICON LAYER STRUCTURES
Authors: LI YX FRENCH PJ WOLFFENBUTTEL RF
Citation: Yx. Li et al., EFFECTS OF PLASMA-ETCHING CHEMISTRY AND POST-PROCESSING ON THE MECHANICAL ADHESION AND ELECTRICAL CONTACT OF DOUBLE POLYSILICON LAYER STRUCTURES, I.E.E.E. transactions on electron devices, 42(1), 1995, pp. 64-69
LOW-STRESS NITRIDE AS OXIDATION MASK FOR SUBMICROMETER LOCOS ISOLATION
Authors: VANZEIJL HW NANVER LK FRENCH PJ
Citation: Hw. Vanzeijl et al., LOW-STRESS NITRIDE AS OXIDATION MASK FOR SUBMICROMETER LOCOS ISOLATION, Electronics Letters, 31(11), 1995, pp. 927-929
ANISOTROPICALLY ETCHED SILICON MIRRORS FOR OPTICAL SENSOR APPLICATIONS
Authors: KWA TA FRENCH PJ WOLFFENBUTTEL RF SARRO PM HELLEMANS L SNAUWAERT J
Citation: Ta. Kwa et al., ANISOTROPICALLY ETCHED SILICON MIRRORS FOR OPTICAL SENSOR APPLICATIONS, Journal of the Electrochemical Society, 142(4), 1995, pp. 1226-1233
SURFACE MICROMACHINED TUNABLE INTERFEROMETER ARRAY
Authors: ARATANI K FRENCH PJ SARRO PM POENAR D WOLFFENBUTTEL RF MIDDELHOEK S
Citation: K. Aratani et al., SURFACE MICROMACHINED TUNABLE INTERFEROMETER ARRAY, Sensors and actuators. A, Physical, 43(1-3), 1994, pp. 17-23
AN INTEGRATED SILICON COLOR SENSOR USING SELECTIVE EPITAXIAL-GROWTH
Authors: BARTEK M GENNISSEN PTJ SARRO P FRENCH PJ WOLFFENBUTTEL RF
Citation: M. Bartek et al., AN INTEGRATED SILICON COLOR SENSOR USING SELECTIVE EPITAXIAL-GROWTH, Sensors and actuators. A, Physical, 41(1-3), 1994, pp. 123-128
PSG LAYERS FOR SURFACE MICROMACHINING
Authors: POENAR D FRENCH PJ MALLEE R SARRO PM WOLFFENBUTTEL RF
Citation: D. Poenar et al., PSG LAYERS FOR SURFACE MICROMACHINING, Sensors and actuators. A, Physical, 41(1-3), 1994, pp. 304-309
REACTIVE ION ETCHING (RIE) TECHNIQUES FOR MICROMACHINING APPLICATIONS
Authors: LI YX WOLFFENBUTTEL MR FRENCH PJ LAROS M SARRO PM WOLFFENBUTTEL RF
Citation: Yx. Li et al., REACTIVE ION ETCHING (RIE) TECHNIQUES FOR MICROMACHINING APPLICATIONS, Sensors and actuators. A, Physical, 41(1-3), 1994, pp. 317-323
INDOMETHACIN POTENTIATES THE INDUCTION OF HL-60 DIFFERENTIATION TO NEUTROPHILS, BY RETINOIC ACID AND GRANULOCYTE-COLONY-STIMULATING FACTOR,AND TO MONOCYTES, BY VITAMIN-D-3
Authors: BUNCE CM FRENCH PJ DURHAM J STOCKLEY RA MICHELL RH BROWN G
Citation: Cm. Bunce et al., INDOMETHACIN POTENTIATES THE INDUCTION OF HL-60 DIFFERENTIATION TO NEUTROPHILS, BY RETINOIC ACID AND GRANULOCYTE-COLONY-STIMULATING FACTOR,AND TO MONOCYTES, BY VITAMIN-D-3, Leukemia, 8(4), 1994, pp. 595-604
THE INTRACELLULAR-DISTRIBUTION OF INOSITOL POLYPHOSPHATES IN HL-60 PROMYELOID CELLS
Authors: STUART JA ANDERSON KL FRENCH PJ KIRK CJ MICHELL RH
Citation: Ja. Stuart et al., THE INTRACELLULAR-DISTRIBUTION OF INOSITOL POLYPHOSPHATES IN HL-60 PROMYELOID CELLS, Biochemical journal, 303, 1994, pp. 517-525
INTRACELLULAR CONCENTRATIONS OF INOSITOL, GLYCEROPHOSPHOINOSITOL AND INOSITOL PENTAKISPHOSPHATE INCREASE DURING HEMATOPOIETIC-CELL DIFFERENTIATION
Authors: MOUNTFORD JC BUNCE CM FRENCH PJ MICHELL RH BROWN G
Citation: Jc. Mountford et al., INTRACELLULAR CONCENTRATIONS OF INOSITOL, GLYCEROPHOSPHOINOSITOL AND INOSITOL PENTAKISPHOSPHATE INCREASE DURING HEMATOPOIETIC-CELL DIFFERENTIATION, Biochimica et biophysica acta. Molecular cell research, 1222(1), 1994, pp. 101-108
COMPARISON OF TECHNIQUES FOR MEASURING BOTH COMPRESSIVE AND TENSILE-STRESS IN THIN-FILMS
Authors: VANDRIEENHUIZEN BP GOOSEN JFL FRENCH PJ WOLFFENBUTTEL RF
Citation: Bp. Vandrieenhuizen et al., COMPARISON OF TECHNIQUES FOR MEASURING BOTH COMPRESSIVE AND TENSILE-STRESS IN THIN-FILMS, Sensors and actuators. A, Physical, 37-8, 1993, pp. 756-765
PLASMA-ETCHING OF POLYSILICON NITRIDE POLYSILICON SANDWICH STRUCTURE FOR SENSOR APPLICATIONS
Authors: LI YX LAROS M SARRO PM FRENCH PJ WOLFFENBUTTEL RF
Citation: Yx. Li et al., PLASMA-ETCHING OF POLYSILICON NITRIDE POLYSILICON SANDWICH STRUCTURE FOR SENSOR APPLICATIONS, Microelectronic engineering, 21(1-4), 1993, pp. 341-344
PROCESS DESIGN FOR PLASMA-ETCHING OF POLYSILICON SILICON-NITRIDE POLYSILICON SANDWICH STRUCTURES FOR SENSOR APPLICATIONS
Authors: LI YX LAROS M SARRO PM FRENCH PJ WOLFFENBUTTEL RF
Citation: Yx. Li et al., PROCESS DESIGN FOR PLASMA-ETCHING OF POLYSILICON SILICON-NITRIDE POLYSILICON SANDWICH STRUCTURES FOR SENSOR APPLICATIONS, Microelectronic engineering, 20(4), 1993, pp. 321-328
PHOTOLUMINESCENCE AND ELECTROLUMINESCENCE FROM POROUS SI
Authors: KANEKO H FRENCH PJ WOLFFENBUTTEL RF
Citation: H. Kaneko et al., PHOTOLUMINESCENCE AND ELECTROLUMINESCENCE FROM POROUS SI, Journal of luminescence, 57(1-6), 1993, pp. 101-104
Risultati: 1-25 | 26-46 |