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Results: 1-9 |
Results: 9
SCALPEL mark detection using Si/SiO2 and 100 keV backscattered electrons
Authors: Farrow, RC Mkrtchyan, M Kizilyalli, IC Waskiewicz, WK Hopkins, LC Alakan, A Gibson, G Brown, P Misra, S Trimble, L
Citation: Rc. Farrow et al., SCALPEL mark detection using Si/SiO2 and 100 keV backscattered electrons, J VAC SCI B, 19(5), 2001, pp. 1852-1856
Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system
Authors: Liddle, JA Blakey, MI Bolan, K Farrow, RC Gallatin, GM Kasica, R Katsap, V Knurek, CS Li, J Mkrtchyan, M Novembre, AE Ocola, L Orphanos, PA Peabody, ML Stanton, ST Teffeau, K Waskiewicz, WK Munro, E
Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481
SCALPEL aerial image monitoring: Principles and application to space charge
Authors: Gallatin, GM Farrow, RC Liddle, JA Waskiewicz, WK Mkrtchyan, MM Orphanos, P Felker, J Kraus, J Biddick, CJ Stanton, S Novembre, AE Blakey, M
Citation: Gm. Gallatin et al., SCALPEL aerial image monitoring: Principles and application to space charge, J VAC SCI B, 18(5), 2000, pp. 2560-2564
Global space charge effect in SCALPEL
Authors: Mkrtchyan, M Munro, E Liddle, JA Stanton, ST Waskiewicz, WK Farrow, RC Katsap, V
Citation: M. Mkrtchyan et al., Global space charge effect in SCALPEL, MICROEL ENG, 53(1-4), 2000, pp. 299-302
Marks for SCALPEL((R)) tool optics optimization
Authors: Farrow, RC Gallatin, GM Waskiewicz, WK Liddle, JA Kizilyalli, I Kornblit, A Biddick, C Blakey, M Klemens, F Felker, J Kraus, J Mkrtchyan, M Orphanos, PA Layadi, N Merchant, S
Citation: Rc. Farrow et al., Marks for SCALPEL((R)) tool optics optimization, MICROEL ENG, 53(1-4), 2000, pp. 309-312
Optimization of a SCALPEL (R) exposure tool using a diffractive image quality technique
Authors: Eichner, L Blakey, MI Farrow, RC Liddle, JA Orphanos, PA Waskiewicz, WK
Citation: L. Eichner et al., Optimization of a SCALPEL (R) exposure tool using a diffractive image quality technique, MICROEL ENG, 46(1-4), 1999, pp. 239-242
CMOS compatible alignment marks for the SCALPEL proof of lithography tool
Authors: Farrow, RC Waskiewicz, WK Kizilyalli, I Ocola, L Felker, J Biddick, C Gallatin, G Mkrtchyan, M Blakey, M Kraus, J Novembre, A Orphanos, P Peabody, M Kasica, R Kornblit, A Klemens, F
Citation: Rc. Farrow et al., CMOS compatible alignment marks for the SCALPEL proof of lithography tool, MICROEL ENG, 46(1-4), 1999, pp. 263-266
Pattern processing results and characteristics for SCALPEL masks
Authors: Novembre, AE Blakey, MI Farrow, RC Kasica, RJ Knurek, CS Liddle, JA Peabody, ML
Citation: Ae. Novembre et al., Pattern processing results and characteristics for SCALPEL masks, MICROEL ENG, 46(1-4), 1999, pp. 271-274
Commercialization of SCALPEL masks
Authors: Farrow, RC Novembre, AE Peabody, M Kasica, R Blakey, M Liddle, JA Werder, K DeMarco, R Ocola, L Rutberg, L Saunders, T Unruh, J Qian, F Smith, M
Citation: Rc. Farrow et al., Commercialization of SCALPEL masks, J VAC SCI B, 16(6), 1998, pp. 3582-3586
Risultati: 1-9 |