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Results: 1-8 |
Results: 8
Investigations on doping of amorphous and nanocrystalline silicon films deposited by catalytic chemical vapour deposition
Authors: Fonrodona, M Soler, D Bertomeu, J Andreu, J
Citation: M. Fonrodona et al., Investigations on doping of amorphous and nanocrystalline silicon films deposited by catalytic chemical vapour deposition, THIN SOL FI, 395(1-2), 2001, pp. 125-129
Stability of hydrogenated nanocrystalline silicon thin-film transistors
Authors: Orpella, A Voz, C Puigdollers, J Dosev, D Fonrodona, M Soler, D Bertomeu, J Asensi, JM Andreu, J Alcubilla, R
Citation: A. Orpella et al., Stability of hydrogenated nanocrystalline silicon thin-film transistors, THIN SOL FI, 395(1-2), 2001, pp. 335-338
Thin silicon films ranging from amorphous to nanocrystalline obtained by hot-wire CVD
Authors: Soler, D Fonrodona, M Voz, C Bertomeu, J Andreu, J
Citation: D. Soler et al., Thin silicon films ranging from amorphous to nanocrystalline obtained by hot-wire CVD, THIN SOL FI, 383(1-2), 2001, pp. 189-191
Optoelectronic studies in nanocrystalline silicon Schottky diodes obtainedby hot-wire CVD
Authors: Voz, C Soler, D Fonrodona, M Bertomeu, J Asensi, JM Andreau, J
Citation: C. Voz et al., Optoelectronic studies in nanocrystalline silicon Schottky diodes obtainedby hot-wire CVD, THIN SOL FI, 383(1-2), 2001, pp. 258-260
Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition
Authors: Dosev, DK Puigdollers, J Orpella, A Voz, C Fonrodona, M Soler, D Marsal, LF Pallares, J Bertomeu, J Andreu, J Alcubilla, R
Citation: Dk. Dosev et al., Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition, THIN SOL FI, 383(1-2), 2001, pp. 307-309
Microdoping compensation of microcrystalline silicon obtained by hot-wire chemical vapour deposition
Authors: Voz, C Peiro, D Fonrodona, M Soler, D Bertomeu, J Andreu, J
Citation: C. Voz et al., Microdoping compensation of microcrystalline silicon obtained by hot-wire chemical vapour deposition, SOL EN MAT, 63(3), 2000, pp. 237-246
Optimisation of doped microcrystalline silicon films deposited at very lowtemperatures by hot-wire CVD
Authors: Voz, C Peiro, D Bertomeu, J Soler, D Fonrodona, M Andreu, J
Citation: C. Voz et al., Optimisation of doped microcrystalline silicon films deposited at very lowtemperatures by hot-wire CVD, MAT SCI E B, 69, 2000, pp. 278-283
Structure of microcrystalline silicon films deposited at very low temperatures by hot-wire CVD
Authors: Peiro, D Bertomeu, J Voz, C Fonrodona, M Soler, D Andreu, J
Citation: D. Peiro et al., Structure of microcrystalline silicon films deposited at very low temperatures by hot-wire CVD, MAT SCI E B, 69, 2000, pp. 536-541
Risultati: 1-8 |