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Results:
1-15
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Results: 15
Authors:
Franta, D
Ohlidal, I
Frumar, M
Jedelsky, J
Citation: D. Franta et al., Optical characterization of chalcogenide thin films, APPL SURF S, 175, 2001, pp. 555-561
Authors:
Franta, D
Ohlidal, I
Klapetek, P
Pokorny, P
Ohlidal, M
Citation: D. Franta et al., Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy, SURF INT AN, 32(1), 2001, pp. 91-94
Authors:
Zajickova, L
Veltruska, K
Tsud, N
Franta, D
Citation: L. Zajickova et al., XPS and ellipsometric study of DLC/silicon interface, VACUUM, 61(2-4), 2001, pp. 269-273
Authors:
Franta, D
Zajickova, L
Ohlidal, I
Janca, J
Citation: D. Franta et al., Optical characterization of diamond-like carbon films, VACUUM, 61(2-4), 2001, pp. 279-283
Authors:
Ohlidal, I
Franta, D
Ohlidal, M
Navratil, K
Citation: I. Ohlidal et al., Determination of thicknesses and spectral dependences of refractive indices of non-absorbing and weakly absorbing thin films using the wavelengths related to extrema in spectral reflectances, VACUUM, 61(2-4), 2001, pp. 285-289
Authors:
Ohlidal, I
Franta, D
Ohlidal, M
Navratil, K
Citation: I. Ohlidal et al., Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances, APPL OPTICS, 40(31), 2001, pp. 5711-5717
Authors:
Franta, D
Ohlidal, I
Citation: D. Franta et I. Ohlidal, Analysis of thin films by optical multi-sample methods, ACT PHYS SL, 50(4), 2000, pp. 411-421
Authors:
Ohlidal, I
Franta, D
Citation: I. Ohlidal et D. Franta, Matrix formalism for imperfect thin films, ACT PHYS SL, 50(4), 2000, pp. 489-500
Authors:
Franta, D
Ohlidal, I
Citation: D. Franta et I. Ohlidal, Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry, SURF INT AN, 30(1), 2000, pp. 574-579
Authors:
Pavelka, R
Ohlidal, I
Hlavka, J
Franta, D
Sitter, H
Citation: R. Pavelka et al., Optical characterization of thin films with randomly rough boundaries using the photovoltage method, THIN SOL FI, 366(1-2), 2000, pp. 43-50
Authors:
Franta, D
Ohlidal, I
Klapetek, P
Citation: D. Franta et al., Analysis of slightly rough thin films by optical methods and AFM, MIKROCH ACT, 132(2-4), 2000, pp. 443-447
Authors:
Ohlidal, M
Uncovsky, M
Ohlidal, I
Franta, D
Citation: M. Ohlidal et al., Determination of the basic parameters characterizing the roughness of metal surfaces by laser light scattering, J MOD OPT, 46(2), 1999, pp. 279-293
Authors:
Ohlidal, I
Franta, D
Pincik, E
Ohlidal, M
Citation: I. Ohlidal et al., Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy, SURF INT AN, 28(1), 1999, pp. 240-244
Authors:
Franta, D
Ohlidal, I
Munzar, D
Hora, J
Navratil, K
Manfredotti, C
Fizzotti, F
Vittone, E
Citation: D. Franta et al., Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry, THIN SOL FI, 344, 1999, pp. 295-298
Authors:
Zajickova, L
Bursikova, V
Franta, D
Citation: L. Zajickova et al., The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films, CZEC J PHYS, 49(8), 1999, pp. 1213-1228
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1-15
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