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Citation: G. Frisque et al., Modeling pattern transfer in ion-beam lithography masks, MICROEL ENG, 53(1-4), 2000, pp. 623-626

Authors: Tejeda, R Frisque, G Engelstad, R Lovell, E Haugeneder, E Loschner, H

Citation: R. Tejeda et al., Finite element simulation of ion-beam lithography mask fabrication, MICROEL ENG, 46(1-4), 1999, pp. 485-488